Target profile for a physical vapor deposition chamber target
First Claim
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1. The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.
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1 Claim
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1. The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.
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Current AssigneeApplied Materials Incorporated
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Original AssigneeApplied Materials Incorporated
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InventorsRiker, Martin Lee, Zhang, Fuhong, Wang, Xiaodong
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Primary Examiner(s)Oswecki, Elizabeth J
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Application NumberUS29/579,470Time in Patent Office816 DaysField of SearchD13182, D151441, D151442, D15199US Class CurrentCPC Class CodesN/A
