Target profile for a physical vapor deposition chamber target
First Claim
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1. The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.
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Accused Products
31 Citations
1 Claim
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1. The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.
Specification
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Current AssigneeApplied Materials Incorporated
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Original AssigneeApplied Materials Incorporated
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InventorsRiker, Martin Lee, Zhang, Fuhong, Wang, Zheng
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Primary Examiner(s)Rudzinski, Kevin K
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Assistant Examiner(s)Jones, Kathleen L
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Application NumberUS29/629,062Time in Patent Office715 DaysField of SearchD22113, D22199, D13182, D151441, D151442, D15144, D15150, D15199US Class CurrentCPC Class CodesN/A
