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Bi mode ion implantation with non-parallel ion beams

  • US RE41,214 E1
  • Filed: 02/08/2005
  • Issued: 04/13/2010
  • Est. Priority Date: 10/30/2000
  • Status: Expired due to Term
First Claim
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1. A method for implanting ions into a workpiece, comprising the steps of:

  • generating an ion beam;

    measuring an angle of non-parallelism of the ion beam;

    performing a first implant with the workpiece oriented at a first angle; and

    performing a second implant with the workpiece oriented at a second angle, wherein the first and second angles are opposite in sign with respect to a reference direction and in magnitude are equal to or greater than the measured angle of non-parallelism.

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