Process for manufacturing high-sensitivity accelerometric and gyroscopic integrated sensors, and sensor thus produced
First Claim
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1. An integrated sensor, comprising:
- a substrate of a first conductivity type and an epitaxial layer of semiconductor material formed on said substrate, said epitaxial layer forming a movable mass which that is surrounded at its sides by a fixed mass;
said movable mass being separated from said substrate by a gap and at the sides from said fixed mass through trenches formed in said epitaxial layer;
said movable mass being supported by said fixed mass through anchorage portions in said epitaxial layer;
and buried conductive regions of second conductivity type formed in the substrate and providing electrical contact between the movable mass and the fixed mass, the buried conductive regions selectively facing the epitaxial layer; and
a weighting region comprising tungsten at said movable mass.
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Abstract
A movable mass forming a seismic mass is formed starting from an epitaxial layer and is covered by a weighting region of tungsten which has high density. To manufacture the mass, buried conductive regions are formed in the substrate. Then, at the same time, a sacrificial region is formed in the zone where the movable mass is to be formed and oxide insulating regions are formed on the buried conductive regions so as to partially cover them. An epitaxial layer is then grown, using a nucleus region. A tungsten layer is deposited and defined and, using a silicon carbide layer as mask, the suspended structure is defined. Finally, the sacrificial region is removed, forming an air gap.
10 Citations
25 Claims
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1. An integrated sensor, comprising:
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a substrate of a first conductivity type and an epitaxial layer of semiconductor material formed on said substrate, said epitaxial layer forming a movable mass which that is surrounded at its sides by a fixed mass;
said movable mass being separated from said substrate by a gap and at the sides from said fixed mass through trenches formed in said epitaxial layer;
said movable mass being supported by said fixed mass through anchorage portions in said epitaxial layer;
andburied conductive regions of second conductivity type formed in the substrate and providing electrical contact between the movable mass and the fixed mass, the buried conductive regions selectively facing the epitaxial layer; and
a weighting region comprising tungsten at said movable mass. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. An integrated sensor comprising:
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a semiconductor substrate having an epitaxial layer formed thereon;
a fixed mass formed in the epitaxial layer on the substrate; and
a movable mass formed in the epitaxial layer and suspended over the substrate to form a gap between the movable mass and the semiconductor substrate, the movable mass including a tungsten layer and being supported by the fixed mass through anchorage portions and separated from the fixed mass by trenches; buried conductive regions of a second conductivity type extending in said substrate and selectively facing said epitaxial layer;
electrically insulating material regions extending on said buried conductive regions and delimiting therebetween portions of selective contact between said buried conductive regions and said movable mass and said fixed mass; and
a weighting region. - View Dependent Claims (9, 10, 11)
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12. An integrated sensor, comprising:
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a substrate having a first conductivity type and an epitaxial layer of semiconductor material, the epitaxial layer configured to have a movable mass surrounded at its sides by a fixed mass, the movable mass being separated from the substrate by a gap and separated at the sides from the fixed mass through trenches, the movable mass being supported by the fixed mass through anchorage portions in the epitaxial layer;
a weighting region comprising tungsten at the movable mass;
buried conductive regions of a second conductivity type extending in the substrate and selectively facing the epitaxial layer;
electrically insulating material regions extending on the buried conductive regions and delimiting therebetween portions of selective contact between the buried conductive regions and the movable mass and the fixed mass; and
deep contact regions extending from a surface of the epitaxial layer as far as the buried conductive regions to form deep contacts. - View Dependent Claims (13, 14, 15, 16)
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17. An integrated sensor, comprising:
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a substrate of a first conductivity type and an epitaxial layer of semiconductor material formed on said substrate, said epitaxial layer forming a movable mass that is surrounded at its sides by a fixed mass;
said movable mass separated from said substrate by a gap and at the sides from said fixed mass through trenches formed in said epitaxial layer;
said movable mass supported by said fixed mass through anchorage portions in said epitaxial layer;
buried conductive regions of a second conductivity type extending in the substrate and selectively facing the epitaxial layer;
electrically insulating material regions extending on the buried conductive regions and delimiting therebetween portions of selective contact between the buried conductive regions and the movable mass and the fixed mass; and
a weighting region comprising a metal at said movable mass. - View Dependent Claims (18, 19)
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20. An integrated sensor, comprising:
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a substrate having a first conductivity type and an epitaxial layer of semiconductor material formed on said substrate, said epitaxial layer forming a movable mass that is surrounded at its sides by a fixed mass;
said movable mass being separated from said substrate by a gap and at the sides from said fixed mass through trenches formed in said epitaxial layer;
said movable mass being supported by said fixed mass through anchorage portions in said epitaxial layer;
a weighting region at said movable mass;
buried conductive regions of a second conductivity type extending in said substrate and selectively facing said epitaxial layer;
electrically insulating material regions extending on said buried conductive regions and delimiting therebetween portions of selective contact between said buried conductive regions and said movable mass and said fixed mass; and
deep contact regions extending from a surface of said epitaxial layer as far as said buried conductive regions to form deep contacts. - View Dependent Claims (21, 22, 23, 24, 25)
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Specification