Lithographic apparatus and device manufacturing method
First Claim
1. A programmable patterning device, comprising:
- a first substrate having thereon an array of contrast elements and a transmissive region or aperture adjacent each contrast element; and
a second substrate having an array of reflectors corresponding in number to the array of contrast elements, each reflector in the array of reflectors being positioned to direct radiation between a respective one of the transmissive regions or apertures to a respective one of the contrast elements in one or both directions.
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Accused Products
Abstract
A system and method are used to form features on a substrate. The system and method include using a first array including individually controllable elements that selectively pattern a beam of radiation, a second array including sets of lenses and apertures stops that form an image from a respective one of the individually controllable elements in a first plane, a third array including lenses that form an image from a respective one of the second array in a second plane, and a substrate table that holds a substrate in the second plane, such that the substrate receives the image from the respective one of the second array. A same spacing is formed between elements in the first, second, and third arrays.
34 Citations
8 Claims
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1. A programmable patterning device, comprising:
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a first substrate having thereon an array of contrast elements and a transmissive region or aperture adjacent each contrast element; and a second substrate having an array of reflectors corresponding in number to the array of contrast elements, each reflector in the array of reflectors being positioned to direct radiation between a respective one of the transmissive regions or apertures to a respective one of the contrast elements in one or both directions. - View Dependent Claims (2, 3, 4, 5)
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6. A lithographic apparatus, comprising:
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an illumination system that supplies a beam of radiation; a patterning array including individually controllable elements that selectively divide the beam of radiation into a plurality of sub-beams modulated according to a desired pattern of the patterning array; and a substrate table that supports a substrate, such that the substrate is positioned to receive the plurality of sub-beams, wherein the patterning array is a programmable patterning device comprising, a first substrate having thereon an array of contrast elements and a transmissive region or aperture adjacent each contrast element, and a second substrate having an array of reflectors corresponding in number to the array of contrast elements, each reflector being positioned to direct radiation between a respective one of the transmissive regions or apertures to a respective one of the contrast elements in one or both directions.
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7. A device manufacturing method, comprising:
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using a patterning device to selectively divide a beam of radiation into a plurality of sub-beams modulated according to a desired pattern on the patterning device, the pattering device including, a first substrate having thereon an array of contrast elements and a transmissive region or aperture adjacent each contrast element, and a second substrate having an array of reflectors corresponding in number to the array of contrast elements, each reflector in the array of reflectors being positioned to direct radiation between a respective one of the transmissive regions or apertures to a respective one of the contrast elements in one or both directions; and positioning a substrate to receive the plurality of sub-beams.
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8. A system, comprising:
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a patterning device configured to selectively divide a beam of radiation into a plurality of sub-beams modulated according to a desired pattern of the patterning device; and a substrate table configured to support a substrate, such that the substrate is positioned to receive the plurality of sub-beams, wherein the patterning device includes, a first substrate having thereon an array of contrast elements and a transmitting region adjacent each contrast element, and a second substrate having an array of reflectors corresponding in number to the array of contrast elements, each reflector being positioned to direct radiation between a respective one of the transmitting regions to a respective one of the contrast elements in one or both directions.
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Specification