Lithographic apparatus and device manufacturing method

• US RE43,515 E1
• Filed: 10/02/2008
• Issued: 07/17/2012
• Est. Priority Date: 03/09/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Gui, Cheng-Qun
• Primary Examiner(s): Nguyen, Hung Henry
• Application Number:
  US12/244,534
• Time in Patent Office: 1,384 Days
• Field of Search: 355/52, 355/53, 355/55, 355 67- 77, 355/57, 356399-401, 430/5, 430/20, 430/30, 250/492.2, 250/548
• US Class Current: 355/57
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

A system and method are used to form features on a substrate. The system and method include using a first array including individually controllable elements that selectively pattern a beam of radiation, a second array including sets of lenses and apertures stops that form an image from a respective one of the individually controllable elements in a first plane, a third array including lenses that form an image from a respective one of the second array in a second plane, and a substrate table that holds a substrate in the second plane, such that the substrate receives the image from the respective one of the second array. A same spacing is formed between elements in the first, second, and third arrays.

Claims

1. A programmable patterning device, comprising:

a first substrate having thereon an array of contrast elements and a transmissive region or aperture adjacent each contrast element; and

a second substrate having an array of reflectors corresponding in number to the array of contrast elements, each reflector in the array of reflectors being positioned to direct radiation between a respective one of the transmissive regions or apertures to a respective one of the contrast elements in one or both directions.

2. The programmable patterning device of claim 1, further comprising:

a microlens array having array of microlenses, a number of the microlenses corresponding a number of contrast elements in the array of contrast elements and being positioned to concentrate incident radiation onto the contrast elements either directly or via the transmissive regions or apertures and reflectors.

3. The programmable patterning device of claim 1, further comprising:

a microlens array having array of microlenses, a number of the microlenses corresponding a number of contrast elements in the array of contrast elements and being positioned to focus radiation selectively passed by respective ones of the contrast elements into an array of microspots.

4. The programmable patterning device of claim 1, wherein the contrast elements are mirrors having a selectively programmed orientation.

5. The programmable patterning device of claim 1, wherein the reflectors on the second substrate are mirrors having a selectively programmed orientation.

6. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

a patterning array including individually controllable elements that selectively divide the beam of radiation into a plurality of sub-beams modulated according to a desired pattern of the patterning array; and

a substrate table that supports a substrate, such that the substrate is positioned to receive the plurality of sub-beams,

wherein the patterning array is a programmable patterning device comprising,

a first substrate having thereon an array of contrast elements and a transmissive region or aperture adjacent each contrast element, and

a second substrate having an array of reflectors corresponding in number to the array of contrast elements, each reflector being positioned to direct radiation between a respective one of the transmissive regions or apertures to a respective one of the contrast elements in one or both directions.

7. A device manufacturing method, comprising:

using a patterning device to selectively divide a beam of radiation into a plurality of sub-beams modulated according to a desired pattern on the patterning device, the pattering device including,

a first substrate having thereon an array of contrast elements and a transmissive region or aperture adjacent each contrast element, and

a second substrate having an array of reflectors corresponding in number to the array of contrast elements, each reflector in the array of reflectors being positioned to direct radiation between a respective one of the transmissive regions or apertures to a respective one of the contrast elements in one or both directions; and

positioning a substrate to receive the plurality of sub-beams.

8. A system, comprising:

a patterning device configured to selectively divide a beam of radiation into a plurality of sub-beams modulated according to a desired pattern of the patterning device; and

a substrate table configured to support a substrate, such that the substrate is positioned to receive the plurality of sub-beams,

wherein the patterning device includes,

a first substrate having thereon an array of contrast elements and a transmitting region adjacent each contrast element, and

a second substrate having an array of reflectors corresponding in number to the array of contrast elements, each reflector being positioned to direct radiation between a respective one of the transmitting regions to a respective one of the contrast elements in one or both directions.