Stamping tool, casting mold and methods for structuring a surface of a work piece

• US RE43,694 E1
• Filed: 06/26/2008
• Issued: 10/02/2012
• Est. Priority Date: 04/28/2000
• Status: Expired due to Term

• Current Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Original Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Inventors: Sawitowski, Thomas
• Primary Examiner(s): Kerns, Kevin P
• Application Number:
  US12/213,990
• Time in Patent Office: 1,559 Days
• Field of Search: 164/72, 164/138, 72/47, 205/223, 205/122
• US Class Current: 164/72
• CPC Class Codes: N/A

Abstract

A simple, cost-effective stamping or molding in the nanometer range is enabled using a stamping surface or molding face with a surface layer having hollow chambers that have been formed by anodic oxidation.

Claims

1. Method for producing a stamping tool with a structured stamping surface, comprising the steps of:

oxidizing a surface or covering layer of the stamping tool for forming the stamping surface at least partially anodally and forming open hollow chambers that are at least essentially uniformly shaped and at least essentially evenly distributed over the surface or surface area of the stamping surface without the use of a model.

2. Method according to claim 1, wherein the surface or covering layer is oxidized potentiostatically.

3. Method according to claim 1, wherein the surface layer or covering layer is oxidized with varying voltage.

4. Method according to claim 3, wherein the surface or covering layer is oxidized galvanostatically.

5. Method according to claim 1, wherein the surface or covering layer that is oxidized is formed of a material selected from the group consisting of aluminum, silicon, iron, steel and titanium.

6. Method according to claim 1, comprising the additional step of modifying the stamping surface at least one of before and after said oxidizing step for producing a rough structure.

13. Method of claim 1, wherein the open hollow chambers include diameters ranging from 10-500 nanometers.

14. Method of claim 1, wherein the open hollow chambers include structural widths ranging from 30-600 nanometers.

15. Method of claim 13, wherein the open hollow chambers include diameters ranging from 15-200 nanometers.

16. Method of claim 15, wherein the open hollow chambers include diameters ranging from 20-100 nanometers.

17. Method of claim 1, wherein the stamping tool includes open hollow chambers of a somewhat conical shape.

18. Method of claim 6, wherein the modifying is done by etching.

19. Method of claim 18, wherein the etching is chemical etching.

25. Method of claim 1, comprising at least one additional step of modifying the hollow chambers after said oxidizing step.

26. Method of claim 25, wherein the modifying is done by etching.

27. Method according to claim 26, wherein the etching is chemical etching.

7. Method for structuring a surface of a work piece in a nanometer range by means of a stamping tool with a structured stamping surface, comprising at least one of pressing and rolling a stamping surface, formed of an anodally oxidized surface or covering layer with open hollow chambers which have diameters in a nanometer range that have been created model-free by anodic oxidation, onto the surface to be structured.

8. Method according to claim 7, wherein the surface is first roughly structured in a first step by means of a first stamping tool and then is finely structured by means of a second stamping tool in a second step.

9. Method according to claim 8, wherein the surface is finely structured by means of said second stamping tool in said second step with a stamping force that is reduced relative to that applied with said first stamping tool.

10. Method according to claim 8, wherein the surface is finely structured by means of said second stamping tool in said second step after hardening of the surface structured by said first step.

20. Method of claim 7, wherein the open hollow chambers include diameters ranging from 10-500 nanometers.

21. Method of claim 20, wherein the open hollow chambers include diameters ranging from 15-200 nanometers.

22. Method of claim 21, wherein the open hollow chambers include diameters ranging from 20-100 nanometers.

23. Method of claim 7, wherein the open hollow chambers include structural widths ranging from 30-600 nanometers.

24. Method of claim 7, wherein the stamping tool includes open hollow chambers of a somewhat conical shape.

11. Method for at least partially structuring a surface of a cast work piece, comprising the steps of:

casting the work piece using a casting mold with a structured molding face having an anodally oxidized surface or covering layer with open hollow chambers created model-free by anodic oxidation.

12. Method according to claim 11, wherein the surface or covering layer is formed at least substantially of a material selected from the group consisting of aluminum oxide, silicon oxide, iron oxide, oxidized steel, and titanium oxide.