Semiconductor memory
First Claim
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1. A semiconductor memory comprising:
- a memory cell having first and second storage terminals storing information of logic levels complementary to each other;
a power supply wiring supplying a predetermined power supply voltage to said memory cell;
first and second pairs of bit lines each electrically connected to said first and second storage terminals of said memory cell, when selected; and
first and second word lines connected to said memory cell, said first pair of bit lines connected to said memory cell and at least reading out data stored at said first and second storage terminals from said memory cell in response to a signal on said first word line, and said second pair of bit lines connected to said memory cell and at least reading out data stored at said first and second storage terminals from said memory cell in response to a signal on said second word line, whereinsaid first and second pairs of bit lines and said power supply wiring are provided in parallel to each other, with said power supply wiring interposed between said first and second pairs of bit lines.
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Abstract
A semiconductor memory having a memory cell structure capable of reducing soft error without complicating a circuit configuration. Specifically, an inverter (I1) consists of a NMOS transistor (N1) and a PMOS transistor (P1), and an inverter (I2) consists of a NMOS transistor (N2) and a PMOS transistor (P2). The inverters (I1, I2) are subjected to cross section. The NMOS transistor (N1) is formed within a P well region (PW0), and the NMOS transistor (N2) is formed within a P well region (PW1). The P well regions (PW0, PW1) are oppositely disposed with an N well region (NW) interposed therebetween.
13 Citations
15 Claims
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1. A semiconductor memory comprising:
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a memory cell having first and second storage terminals storing information of logic levels complementary to each other; a power supply wiring supplying a predetermined power supply voltage to said memory cell; first and second pairs of bit lines each electrically connected to said first and second storage terminals of said memory cell, when selected; and first and second word lines connected to said memory cell, said first pair of bit lines connected to said memory cell and at least reading out data stored at said first and second storage terminals from said memory cell in response to a signal on said first word line, and said second pair of bit lines connected to said memory cell and at least reading out data stored at said first and second storage terminals from said memory cell in response to a signal on said second word line, wherein said first and second pairs of bit lines and said power supply wiring are provided in parallel to each other, with said power supply wiring interposed between said first and second pairs of bit lines. - View Dependent Claims (2, 3)
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4. A semiconductor device having a memory cell of a static random access memory, which includes first to eighth transistors, the device comprising:
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a first pair of impurity regions of a first conductivity type functioning as two electrodes of the first transistor; a second pair of impurity regions of the first conductivity type functioning as two electrodes of the second transistor; a third pair of impurity regions of a second conductivity type functioning as two electrodes of the third transistor; a fourth pair of impurity regions of the second conductivity type functioning as two electrodes of the fourth transistor; a fifth pair of impurity regions of the second conductivity type functioning as two electrodes of the fifth transistor; a sixth pair of impurity regions of the second conductivity type functioning as two electrodes of the sixth transistor; a seventh pair of impurity regions of the second conductivity type functioning as two electrodes of the seventh transistor; an eighth pair of impurity regions of the second conductivity type functioning as two electrodes of the eighth transistor; a first conductive layer functioning as a gate electrode common to the first and third transistors; a second conductive layer functioning as a gate electrode common to the second and sixth transistors; a third conductive layer functioning as a gate electrode common to the fourth and fifth transistors; a fourth conductive layer functioning as a gate electrode common to the seventh and eighth transistors; a fifth conductive layer electrically connected to the second conductive layer, one of the first pair of impurity regions, one of the third pair of impurity regions, one of the fourth pair of impurity regions and one of the eighth pair of impurity regions, and configuring a first storage terminal of the memory cell; a sixth conductive layer electrically connected to the first conductive layer, one of the second pair of impurity regions, one of the sixth pair of impurity regions, one of the seventh pair of impurity regions and one of the fifth pair of impurity regions, and configuring a second storage terminal of the memory cell; a first word line electrically connected to the third conductive layer; a second word line electrically connected to the fourth conductive layer; a first bit line electrically connected to the other of the fourth pair of impurity regions; a second bit line electrically connected to the other of the fifth pair of impurity regions; a third bit line electrically connected to the other of the seventh pair of impurity regions; and a fourth bit line electrically connected to the other of the eighth pair of impurity regions. - View Dependent Claims (5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification