Electrochromic devices and manufacturing methods thereof

• US 10,012,887 B2
• Filed: 04/14/2014
• Issued: 07/03/2018
• Est. Priority Date: 04/18/2013
• Status: Active Grant

• Current Assignee: ChromoGenics AB
• Original Assignee: ChromoGenics AB
• Inventors: Karmhag, Richard, Gregard, Greger, Vogt, Roger
• Primary Examiner(s): Sahle, Mahidere
• Application Number:
  US14/784,897
• Publication Number:
  US 20160085128A1
• Time in Patent Office: 1,541 Days
• Field of Search: 359275
• CPC Class Codes: B23K 26/351 for trimming or tuning of electrical components
• CPC Class Codes: B26D 3/282 by peeling-off
• CPC Class Codes: B26F 1/18 Perforating by slitting, i.e. forming cuts closed at their ends without removal of material
• CPC Class Codes: G02F 1/133305 Flexible substrates, e.g. plastics, organic film
• CPC Class Codes: G02F 1/13458 Terminal pads
• CPC Class Codes: G02F 1/1533 structural features not otherwise provided for
• CPC Class Codes: G02F 2201/56 Substrates having a particular shape, e.g. non-rectangular

Abstract

A method for enhancing the reliability of contacting the conductive layers in a laminated electrochromic device structure is disclosed (FIG. 7). The laminate structure (10), typically fabricated in the form of a sheet, comprises: two polymer substrates (21, 22); two conductive layers (31, 32)—one arranged on each substate—and facing each other; an electrochromic layer (41) and a counter-electrode layer (42) each arranged on different conductive layers; and an electrolyte layer (50) interposed between the electrochromic layer and the counter-electrode layer. Either an incision with an undulating cutting depth or perforations of predetermined sizes, depths (through at least most of one substrate) and separations are prefabricated along a desired tear line in the structure (step 220)—once the final shape of the device is defined—to facilitate the tearing away of the one polymer substrate to reveal the conductive layer to be contacted on the underlying substrate.

Claims

1. A method for producing an electrochromic device, comprising the steps of:

providing an electrochromic layered structure having a first substrate sheet, a second substrate sheet, said first substrate sheet and said second substrate sheet being polymer substrates, a first electron conducting layer at least partially covering said first substrate sheet, a second electron conducting layer at least partially covering said second substrate sheet, a first electrochromic layer at least partially covering said first electron conducting layer, a counter electrode layer at least partially covering said second electron conducting layer, and an electrolyte layer laminated between and at least partially covering said first electrochromic layer and said counter electrode layer; and

creating fracture indications along a line into one of said first substrate sheet and said second substrate sheet, wherein at least a part of said fracture indications cut through at least a major part of said first substrate sheet or said second substrate sheet, respectively, and through at least a part of the first electron conducting layer or the second electron conducting layer, respectively, said line of fracture indications enabling removal of a part of said first substrate sheet or said second substrate sheet by ripping said first substrate sheet or said second substrate sheet along the line of fracture indications, thereby exposing at least a part of a half cell having said second electron conducting layer or said first electron conducting layer, respectively, which provides electron conduction into an area of said electrochromic layered structure having both said first substrate sheet and said second substrate sheet.

2. The method according to claim 1, wherein said step of creating fracture indications comprises forming at least one incision, cutting through at least a major part of said first substrate sheet or said second substrate sheet, respectively.

3. The method according to claim 2 wherein said forming at least one incision comprises forming of at least one incision having an undulating cutting depth along said line.

4. The method according to claim 1, wherein said step of creating fracture indications comprises perforating said first substrate sheet or said second substrate sheet by of a series of holes along said line.

5. The method according to claim 4, wherein

said perforating is performed causing said holes to penetrate one of:

said first substrate sheet, said first electron conducting layer and said first electrochromic layer; and

said second substrate sheet, said second electron conducting layer and said counter electrode layer.

6. The method according to claim 5, wherein said holes are non-through holes with respect to said electrochromic layered structure.

7. The method according to claim 5, wherein said holes have a respective largest diameter in an interface between said first electron conducting layer and said first substrate sheet or in an interface between said second electron conducting layer and said second substrate sheet, respectively, that is less than 0.2 mm.

8. The method according to claim 5, wherein two neighboring ones of said holes are separated in an interface between said first electron conducting layer and said first substrate sheet or in an interface between said second electron conducting layer and said second substrate sheet, respectively, by less than less than 1 mm.

9. The method according to claim 5, wherein a ratio, between a respective diameter in an interface between said first electron conducting layer and said first substrate sheet or in an interface between said second electron conducting layer and said second substrate sheet, respectively, of said hole in a direction of a neighboring hole and a distance in said interface between said first electron conducting layer and said first substrate sheet or in said interface between said second electron conducting layer and said second substrate sheet, respectively, separating said hole and said neighboring hole, is larger than 0.1.

10. The method according to claim 1, wherein said fracture indications are created by laser ablation.

11. The method according to claim 1, further comprising the step of:

ripping off a part of said one of;

said first substrate sheet; and

said second substrate sheet,

along said line of said fracture indications.

12. An electrochromic layered structure, comprising:

a first substrate sheet;

a second substrate sheet;

said first substrate sheet and said second substrate sheet being polymer substrates;

a first electron conducting layer at least partially covering said first substrate sheet;

a second electron conducting layer at least partially covering said second substrate sheet;

an electrochromic layer at least partially covering said first electron conducting layer;

a counter electrode layer at least partially covering said second electron conducting layer; and

an electrolyte layer laminated between and at least partially covering said first electrochromic layer and said counter electrode layer,

said electrochromic layered structure having fracture indications along a line into one of said first substrate sheet and said second substrate sheet wherein at least a part of said fracture indications cut through at least a major part of said first substrate sheet or said second substrate sheet, respectively, and through at least a part of the first electron conducting layer or the second electron conducting layer, respectively, said line of fracture indications enabling removal of a part of said first substrate sheet or said second substrate sheet by ripping said first substrate sheet or said second substrate sheet along the line of fracture indications, thereby exposing at least a part of a half cell having said second electron conducting layer or said first electron conducting layer, respectively, which provides electron conduction into an area of said electrochromic layered structure having both said first substrate sheet and said second substrate sheet.

13. The electrochromic layered structure according to claim 12, wherein said fracture indications comprise at least one incision, cutting through at least a major part of said first substrate sheet or said second substrate sheet, respectively.

14. The electrochromic layered structure according to claim 13, wherein said at least one incision has an undulating cutting depth along said line.

15. The electrochromic layered structure according to claim 12, wherein said fracture indications comprise a perforation in said first substrate sheet or said second substrate sheet constituted by of a series of holes along said line.

16. The electrochromic layered structure according to claim 15, wherein said holes penetrate at least one of:

said first substrate sheet, said first electron conducting layer and said first electrochromic layer; and

said second substrate sheet, said second electron conducting layer and said counter electrode layer.

17. The electrochromic layered structure according to claim 16, wherein said holes are non-through holes with respect to said electrochromic layered structure.

18. The electrochromic layered structure according to claim 16, wherein said holes have a respective largest diameter in an interface between said first electron conducting layer and said first substrate sheet or in an interface between said second electron conducting layer and said second substrate sheet that is less than 0.2 mm.

19. The electrochromic layered structure according to claim 16, wherein two neighboring ones of said holes are separated in an interface between said first electron conducting layer and said first substrate sheet or in an interface between said second electron conducting layer and said second substrate sheet, respectively, by less than less than 1 mm.

20. The electrochromic layered structure according to claim 16, wherein a ratio between a respective diameter in an interface between said first electron conducting layer and said first substrate sheet or in an interface between said second electron conducting layer and said second substrate sheet, respectively, of said hole in a direction of a neighboring hole and a distance in said interface between said first electron conducting layer and said first substrate sheet or in said interface between said second electron conducting layer and said second substrate sheet, respectively, separating two neighboring ones of said holes is larger than 0.1.

21. The electrochromic layered structure according to claim 16, wherein said holes have a respective largest diameter in an interface between said first electron conducting layer and said first substrate sheet or in an interface between said second electron conducting layer and said second substrate sheet, respectively, that is less than 0.1 mm.

22. The electrochromic layered structure according to claim 16, wherein said holes have a respective largest diameter in an interface between said first electron conducting layer and said first substrate sheet or in an interface between said second electron conducting layer and said second substrate sheet, respectively, that is less than 0.05 mm.

23. The electrochromic layered structure according to claim 16, wherein two neighboring ones of said holes are separated in an interface between said first electron conducting layer and said first substrate sheet or in an interface between said second electron conducting layer and said second substrate sheet, respectively, by less than less than 0.5 mm.

24. The electrochromic layered structure according to claim 16, wherein two neighboring ones of said holes are separated in an interface between said first electron conducting layer and said first substrate sheet or in an interface between said second electron conducting layer and said second substrate sheet, respectively, by less than less than 0.2 mm.

25. The electrochromic layered structure according to claim 16, wherein a ratio between a respective diameter in an interface between said first electron conducting layer and said first substrate sheet or in an interface between said second electron conducting layer and said second substrate sheet, respectively, of said hole in a direction of a neighboring hole and a distance in said interface between said first electron conducting layer and said first substrate sheet or in said interface between said second electron conducting layer and said second substrate sheet, respectively, separating two neighboring ones of said holes is larger than 0.2.

26. The electrochromic layered structure according to claim 16, wherein a ratio between a respective diameter in an interface between said first electron conducting layer and said first substrate sheet or in an interface between said second electron conducting layer and said second substrate sheet, respectively, of said hole in a direction of a neighboring hole and a distance in said interface between said first electron conducting layer and said first substrate sheet or in said interface between said second electron conducting layer and said second substrate sheet, respectively, separating two neighboring ones of said holes is larger than 0.4.

27. A method for producing an electrochromic device, comprising the steps of:

providing an electrochromic layered structure having a first substrate sheet, a second substrate sheet, said first substrate sheet and said second substrate sheet being polymer substrates, a first electron conducting layer at least partially covering said first substrate sheet, a second electron conducting layer at least partially covering said second substrate sheet, a first electrochromic layer at least partially covering said first electron conducting layer, a counter electrode layer at least partially covering said second electron conducting layer, and an electrolyte layer laminated between and at least partially covering said first electrochromic layer and said counter electrode layer; and

creating fracture indications along a line into one of said first substrate sheet and said second substrate sheet, wherein at least a part of said fracture indications cut through at least a major part of said first substrate sheet or said second substrate sheet, respectively, where the first electron conducting layer or the second electron conducting layer covers the first substrate sheet or the second substrate sheet, respectively, said line of fracture indications enabling removal of a part of said first substrate sheet or said second substrate sheet by ripping said first substrate sheet or said second substrate sheet along the line of fracture indications, thereby exposing at least a part of a half cell having said second electron conducting layer or said first electron conducting layer, respectively, which provides electron conduction into an area of said electrochromic layered structure having both said first substrate sheet and said second substrate sheet.

28. An electrochromic layered structure, comprising:

a first substrate sheet;

a second substrate sheet;

said first substrate sheet and said second substrate sheet being polymer substrates;

a first electron conducting layer at least partially covering said first substrate sheet;

a second electron conducting layer at least partially covering said second substrate sheet;

an electrochromic layer at least partially covering said first electron conducting layer;

a counter electrode layer at least partially covering said second electron conducting layer; and

an electrolyte layer laminated between and at least partially covering said first electrochromic layer and said counter electrode layer,

said electrochromic layered structure having fracture indications along a line into one of said first substrate sheet and said second substrate sheet, wherein at least a part of said fracture indications cut through at least a major part of said first substrate sheet or said second substrate sheet, respectively, where the first electron conducting layer or the second electron conducting layer covers the first substrate sheet or the second substrate sheet, respectively, said line of fracture indications enabling removal of a part of said first substrate sheet or said second substrate sheet by ripping said first substrate sheet or said second substrate sheet along the line of fracture indications, thereby exposing at least a part of a half cell having said second electron conducting layer or said first electron conducting layer, respectively, which provides electron conduction into an area of said electrochromic layered structure having both said first substrate sheet and said second substrate sheet.