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Semiconductor device having recessed edges and method of manufacture

  • US 10,032,746 B2
  • Filed: 09/07/2016
  • Issued: 07/24/2018
  • Est. Priority Date: 09/05/2014
  • Status: Active Grant
First Claim
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1. A method comprising:

  • providing a workpiece, the workpiece having intersecting scribe lines;

    forming one or more first dielectric layers over a first side of the workpiece, the first dielectric layers recessed a first distance from the scribe lines at a first location near a first intersection of the scribe lines, the first dielectric layers recessed a second distance from the scribe lines at a second location, the second location being further from the first intersection than the first location, the first distance being greater than the second distance, wherein the forming the first dielectric layers comprises recessing a first corner a greater distance than a second corner; and

    singulating the workpiece along the scribe lines.

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