Method for manufacturing reflective mask blank, and method for manufacturing reflective mask

• US 10,067,419 B2
• Filed: 02/20/2014
• Issued: 09/04/2018
• Est. Priority Date: 02/22/2013
• Status: Active Grant

• Current Assignee: Hoya Corporation
• Original Assignee: Hoya Corporation
• Inventors: Shoki, Tsutomu, Hamamoto, Kazuhiro, Ikebe, Yohei
• Primary Examiner(s): Wanga, Timon
• Application Number:
  US14/768,787
• Publication Number:
  US 20160004153A1
• Time in Patent Office: 1,657 Days
• Field of Search: None
• CPC Class Codes: C23C 14/024 Deposition of sublayers, e.g. to promote adhesion of the coating C23C14/027 takes precedence
• CPC Class Codes: C23C 14/35 by application of a magnetic field, e.g. magnetron sputtering C23C14/3457 takes precedence
• CPC Class Codes: C23C 14/46 by ion beam produced by an external ion source
• CPC Class Codes: G03F 1/24 Reflection masks; Preparation thereof
• CPC Class Codes: G03F 1/38 Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
• CPC Class Codes: G03F 1/84 Inspecting
• CPC Class Codes: G06T 2207/30148 Semiconductor; IC; Wafer
• CPC Class Codes: G06T 2207/30204 Marker
• CPC Class Codes: G06T 7/0004 Industrial image inspection

Abstract

A method of manufacturing a reflective mask blank comprising a multilayer reflective film formed on a substrate so as to reflect EUV light; and a laminated film formed on the multilayer reflective film. The method includes the steps of depositing the multilayer reflective film on the substrate to form a multilayer reflective film formed substrate; carrying out defect inspection for the multilayer reflective film formed substrate; depositing the laminated film on the multilayer reflective film of the multilayer reflective film formed substrate; forming a fiducial mark for an upper portion of the laminated film to thereby form a reflective mask blank comprising the fiducial mark, the fiducial mark serving as a reference for a defect position in defect information; and carrying out defect inspection of the reflective mask blank by using the fiducial mark as a reference.

Claims

1. A method of manufacturing a reflective mask blank comprising a multilayer reflective film formed on a substrate so as to reflect EUV light;

and a laminated film formed on the multilayer reflective film;

the method comprising the steps of;

depositing the multilayer reflective film on the substrate to form a multilayer reflective film formed substrate;

carrying out first defect inspection for the multilayer reflective film formed substrate in which no fiducial mark is formed;

depositing the laminated film on the multilayer reflective film of the multilayer reflective film formed substrate;

forming a fiducial mark for an upper portion of the laminated film to thereby form a reflective mask blank comprising the fiducial mark, the fiducial mark serving as a reference for a defect position in defect information; and

carrying out second defect inspection of the reflective mask blank by using the fiducial mark as a reference.

2. The method of manufacturing a reflective mask blank according to claim 1, further comprising:

collating first defect inspection data indicative of a result of the first defect inspection for the multilayer reflective film formed substrate and second defect inspection data indicative of a result of the second defect inspection of the reflective mask blank with each other based on a defect which is consistent between a first defect detected by the first defect inspection for the multilayer reflective film formed substrate and a second defect detected by the second defect inspection of the reflective mask blank; and

thereby obtaining a third defect inspection data indicative of a converted result of the first defect inspection for the multilayer reflective film formed substrate using as a reference the fiducial mark formed for the laminated film.

3. The method of manufacturing a reflective mask blank according to claim 1, wherein:

the carrying out first defect inspection for the multilayer reflective film formed substrate carries out for at least for an entire surface of a pattern forming region on the multilayer reflective film formed substrate, and

the carrying out second defect inspection of the reflective mask blank carries out for at least part of defects, which are detected by the first defect inspection for the multilayer reflective film formed substrate, by specifying positions of the defects.

4. The method of manufacturing a reflective mask blank according to claim 1, comprising:

forming, before carrying out first defect inspection for the multilayer reflective film formed substrate, a pseudo defect on the multilayer reflective film of the multilayer reflective film formed substrate; and

further collating first defect inspection data indicative of a result of the first defect inspection for the multilayer reflective film formed substrate and second defect inspection data indicative of a result of the second defect inspection of the reflective mask blank with each other based on the pseudo defect that is detected by the first defect inspection for the multilayer reflective film formed substrate and a defect corresponding to the pseudo defect that is detected by the second defect inspection of the reflective mask blank.

5. The method of manufacturing a reflective mask blank according to claim 1, wherein:

the forming a fiducial mark forms the fiducial mark at a predetermined position from an origin that is set based on edge coordinates of the substrate; and

further correlating the reflective mask blank comprising the fiducial mark and formation position information indicative of a formation potion where the fiducial mark is formed with each other.

6. The method of manufacturing a reflective mask blank according to claim 1, comprising:

specifying, after the forming the fiducial mark and before the carrying out second defect inspection of the reflective mask blank, a formation position where the fiducial mark is formed by a coordinate measuring apparatus; and

further correlating the reflective mask blank comprising the fiducial mark and formation position information indicative of the formation position where the fiducial mark is formed with each other.

7. The method of manufacturing a reflective mask blank according to claim 5, further comprising:

providing defect information indicative of a defect position where a defect is detected in the multilayer reflective film using the fiducial mark as a reference in addition to the formation position information indicative of the formation position where the fiducial mark is formed.

8. A method of manufacturing a reflective mask, comprising:

patterning the laminated film of the reflective mask blank obtained by the method of manufacturing a reflective mask blank according to claim 1; and

thereby forming a laminated film pattern.

9. The method of manufacturing a reflective mask blank according to claim 6, further comprising:

providing defect information indicative of a defect position where a defect is detected in the multilayer reflective film using the fiducial mark as a reference in addition to the formation position information indicative of the formation position where the fiducial mark is formed.

10. The method of manufacturing a reflective mask blank according to claim 1, wherein the laminated film includes an absorber film for absorbing EUV.

11. The method of manufacturing a reflective mask blank according to claim 1, wherein the laminated film includes an absorber film for absorbing EUV and a hard mask film.