Abrasive, abrasive set, and method for abrading substrate

  • US 10,196,542 B2
  • Filed: 10/21/2015
  • Issued: 02/05/2019
  • Est. Priority Date: 02/21/2012
  • Status: Active Grant
First Claim
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1. A polishing agent comprising:

  • water,abrasive grains containing a hydroxide of tetravalent cerium, wherein the abrasive grains produce absorbance of 1.000 or greater for light with a wavelength of 290 nm in an aqueous dispersion having the abrasive grain content adjusted to 0.0065 mass %, andat least one glycerin compound represented by general formula (I) below;

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