Method and apparatus for removing sulfur oxides from gas
First Claim
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1. An apparatus for cleaning gas, the apparatus comprising:
- a chamber that includes;
a gas input;
a first liquid spray array;
a second liquid spray array; and
a demister;
the first liquid spray array and the second liquid spray array being located at different locations within the chamber;
a first source of ammonia bearing liquid having a conduit to the first liquid spray array;
a second source of ammonia bearing liquid having a conduit to the second liquid spray array;
wherein the first source and the second source are configured so that the first source produces ammonia bearing liquid that has a different sulfur absorbing capacity than that produced by the second source.
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Reexamination
Accused Products
Abstract
Methods, apparatus, and compositions for cleaning gas. The use of segmented multistage ammonia-based liquid spray with different oxidation potentials to remove sulfur compounds from gas. The use of different oxidation potentials may reduce unwanted ammonia slip.
51 Citations
77 Claims
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1. An apparatus for cleaning gas, the apparatus comprising:
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a chamber that includes; a gas input; a first liquid spray array; a second liquid spray array; and a demister; the first liquid spray array and the second liquid spray array being located at different locations within the chamber; a first source of ammonia bearing liquid having a conduit to the first liquid spray array; a second source of ammonia bearing liquid having a conduit to the second liquid spray array; wherein the first source and the second source are configured so that the first source produces ammonia bearing liquid that has a different sulfur absorbing capacity than that produced by the second source. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39)
wherein; the pre-washing chamber and the particle control chamber are in gaseous communication with the chamber; and the pre-washing chamber, the particle control chamber, and the chamber are all positioned within a tower.
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21. The apparatus of claim 20 further comprising a crystallization basin that is disposed exterior to the pre-washing chamber.
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22. The apparatus of claim 21 wherein the crystallization basin holds a liquid that contains a sulfur oxide and has a pH less than 6.
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23. The apparatus of claim 1 further comprising an oxidation tank disposed in a tower.
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24. The apparatus of claim 1 further comprising:
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a pre-washing chamber upstream from the chamber; and a particle control chamber downstream from the chamber; wherein; the pre-washing chamber and the particle control chamber are in gaseous communication with the chamber; and the pre-washing chamber, the particle control chamber, and the chamber are distributed among more than one tower.
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25. The apparatus of claim 1 further comprising a crystallization basin that is positioned downstream from a spray array of the spray arrays.
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26. The apparatus of claim 25 wherein the crystallization basin holds a liquid that contains a sulfur oxide and has a pH less than 5.5.
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27. The apparatus of claim 1 further comprising:
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a crystallization basin that is positioned downstream from a spray array of the spray arrays; and a conduit that extends from the crystallization basin to a solid-liquid separation device.
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28. The apparatus of claim 1 further comprising an oxidizing chamber in fluidic communication with the chamber via an oxidizing chamber conduit.
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29. The apparatus of claim 28 wherein the oxidizing chamber includes the first source and the second source.
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30. The apparatus of claim 29 in which the oxidizing chamber comprises 2-8 gas-liquid contactors.
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31. The apparatus of claim 29 wherein the oxidizing chamber is configured to provide for a fraction of the ammonia bearing liquid a residence time within the oxidizing chamber of at least 20 minutes.
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32. The apparatus of claim 28 further comprising:
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an oxidizing gas input to the oxidizing chamber; and a gas-liquid contactor inside the oxidizing chamber and positioned to be in gaseous communication with the oxidizing gas input and in fluidic communication with the oxidizing chamber conduit.
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33. The apparatus of claim 32 in which the gas-liquid contactor includes a structured packing.
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34. The apparatus of claim 32 in which the gas-liquid contactor comprises a random packing.
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35. The apparatus of claim 32 in which the gas-liquid contactor comprises a perforated plate.
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36. The apparatus of claim 32 in which the gas-liquid contactor comprises a bubble cap.
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37. The apparatus of claim 32 in which the gas-liquid contactor comprises an aeration head.
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38. The apparatus of claim 32 further comprising a gas delivery device that is configured to deliver through the gas input no less than 20% more than the minimum stoichiometric amount required to oxidize the ammonia bearing liquid for which the gas-liquid contactor is configured to contact.
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39. The apparatus of claim 1 wherein the ammonia bearing liquid of the second source has a pH greater than 4.6.
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40. An apparatus for cleaning gas, the apparatus comprising:
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a chamber that includes; a gas input; a first liquid spray array; a second liquid spray array; the first liquid spray array and the second liquid spray array being located at different locations within the chamber; a particle control chamber that includes a demister; a first source of ammonia bearing liquid having a conduit to the first liquid spray array; and a second source of ammonia bearing liquid having a conduit to the second liquid spray array; wherein the first source and the second source are configured so that the first source produces ammonia bearing liquid that has a different sulfur absorbing capacity than that produced by the second source. - View Dependent Claims (41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77)
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Specification