Fabrication of low defectivity electrochromic devices
First Claim
1. An electrochromic device comprising:
- a first transparent conductive layer;
an electrochromic layer comprising a tungsten oxide based electrochromic material doped with one or more materials selected from the group consisting of;
molybdenum, vanadium, and titanium;
a counter electrode layer comprising a nickel oxide based counter electrode material doped with tungsten and tantalum; and
a second transparent conductive layer.
3 Assignments
0 Petitions
Accused Products
Abstract
Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.
174 Citations
21 Claims
-
1. An electrochromic device comprising:
-
a first transparent conductive layer; an electrochromic layer comprising a tungsten oxide based electrochromic material doped with one or more materials selected from the group consisting of;
molybdenum, vanadium, and titanium;a counter electrode layer comprising a nickel oxide based counter electrode material doped with tungsten and tantalum; and a second transparent conductive layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
-
Specification