Plasma uniformity control by gas diffuser hole design
First Claim
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1. A method of depositing a thin film on a substrate, comprising:
- placing a substrate on a substrate support that is mounted in a processing region of a processing chamber;
flowing a process fluid through a plurality of gas passages in a diffuser plate toward the substrate supported on the substrate support, wherein the diffuser plate has an upstream side and a downstream side and the downstream side has a substantially concave curvature, and each of the gas passages are formed between the upstream side and the downstream side, and wherein a portion of the plurality of gas passages include a cone shaped hole having a depth that varies from a center to an edge of the diffuser plate; and
creating a plasma between the downstream side of the diffuser plate and the substrate support.
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Abstract
Embodiments of a method of depositing a thin film on a substrate is provided that includes placing a substrate on a substrate support that is mounted in a processing region of a processing chamber, flowing a process fluid through a plurality of gas passages in a diffuser plate toward the substrate supported on the substrate support, wherein the diffuser plate has an upstream side and a downstream side and the downstream side has a substantially concave curvature, and each of the gas passages are formed between the upstream side and the downstream side, and creating a plasma between the downstream side of the diffuser plate and the substrate support.
187 Citations
20 Claims
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1. A method of depositing a thin film on a substrate, comprising:
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placing a substrate on a substrate support that is mounted in a processing region of a processing chamber; flowing a process fluid through a plurality of gas passages in a diffuser plate toward the substrate supported on the substrate support, wherein the diffuser plate has an upstream side and a downstream side and the downstream side has a substantially concave curvature, and each of the gas passages are formed between the upstream side and the downstream side, and wherein a portion of the plurality of gas passages include a cone shaped hole having a depth that varies from a center to an edge of the diffuser plate; and creating a plasma between the downstream side of the diffuser plate and the substrate support. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of depositing a thin film on a substrate, comprising:
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placing a substrate between a substrate support and a diffuser plate that is mounted in a processing region of a processing chamber; flowing a process fluid through a plurality of gas passages such including a hollow cathode cavity formed in a downstream side of the diffuser plate toward the substrate supported on the substrate support, wherein the diffuser plate has an upstream side and the downstream side has a substantially concave curvature, and each of the hollow cathode cavities are fluidly coupled to a bore formed from the upstream side and wherein a portion of the plurality of hollow cathode cavities include a cone shaped hole having a depth that varies from a center to an edge of the diffuser plate; and creating a plasma between the downstream side of the diffuser plate and the substrate support. - View Dependent Claims (13, 14, 15)
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16. A method of depositing a thin film on a substrate, comprising:
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placing a substrate between a substrate support and a diffuser plate that is mounted in a processing region of a processing chamber; flowing a process fluid through a plurality of gas passages formed between an upstream side and a downstream side of the diffuser plate toward the substrate supported on the substrate support, wherein each of the gas passages include; an orifice hole having a first diameter; and a hollow cathode cavity that is downstream of the orifice hole and is at the downstream side, the hollow cathode cavity having a cone or cylinder shape and a second diameter at the downstream side that is greater than the first diameter, the second diameters or the depths or a combination of both of the cones or cylinders increases from the center to the edge of the diffuser plate, and the first diameters are substantially uniform from the center to the edge of the diffuser plate; and creating a plasma between the downstream side of the diffuser plate and the substrate support. - View Dependent Claims (17, 18, 19, 20)
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Specification