Passive device for vapor intrusion sampling

• US 10,324,007 B2
• Filed: 10/04/2017
• Issued: 06/18/2019
• Est. Priority Date: 10/04/2016
• Status: Active Grant

• Current Assignee: CH2M Hill Incorporated (CH2M Hill Companies Limited)
• Original Assignee: CH2M Hill Incorporated (CH2M Hill Companies Limited)
• Inventors: Thompson, Ben, Novak, Michael, Niemet, Michael
• Primary Examiner(s): Dowtin, Jewel V
• Application Number:
  US15/724,811
• Publication Number:
  US 20180095012A1
• Time in Patent Office: 622 Days
• CPC Class Codes: G01N 1/2214 by sorption
• CPC Class Codes: G01N 33/383 Concrete, cement

Abstract

Disclosed herein is a passive vapor intrusion measurement device including a barrier layer having first and second major sides; an absorbent stack disposed on a first portion of the surface of the barrier layer first major side, the absorbent stack including a first absorbent layer, an optional second absorbent layer; and spacer layer(s) disposed between the first and second (if present) absorbent layer and the barrier layer; and an adhesive disposed on a second portion of the surface of the barrier layer first major side and transversely surrounding the absorbent stack. The device is applied to a substrate in need of vapor intrusion sampling. A method of vapor intrusion analysis includes individually collecting the first and second (if present) absorbent layers after a test period; analyzing the amount of an analyte the absorbent layer(s); and subtracting the amount of the analyte in the second absorbent layer (if present) from the amount of the analyte in the first absorbent layer.

Claims

1. A passive vapor intrusion sampling device comprising:

a barrier layer having first and second major sides;

an absorbent stack disposed over a first portion of a surface of the first major side of the barrier layer, the absorbent stack comprising;

a first absorbent layer, and

a first spacer layer disposed between the first absorbent layer and the barrier layer; and

an adhesive layer disposed on a second portion of the surface area of the first major side of the barrier layer and transversely surrounding the absorbent stack.

2. The device of claim 1 further comprising a second absorbent layer and a second spacer layer disposed between the first and second absorbent layers.

3. The device of claim 1 wherein the barrier layer is impermeable to an analyte selected for vapor intrusion analysis.

4. The device of claim 1 wherein the adhesive layer is disposed substantially over the entirety of the surface of the first major side of the barrier layer.

5. The device of claim 1 wherein the first portion of the surface of the first major side of the barrier layer is exclusive of the second portion of the surface of the first major side of the barrier layer.

6. The device of claim 2 wherein the first and second absorbent layers comprise substantially the same absorbent material, and the absorbent material is present in substantially the same amount in the first and second absorbent layers.

7. The device of claim 2 wherein the first and second absorbent layers comprise different absorbent material, and the absorbent material is present in substantially the same amount in the first and second absorbent layers.

8. The device of claim 1 wherein the first absorbent layer comprises activated carbon.

9. The device of claim 2 wherein the first and/or second absorbent layers comprise activated carbon.

10. The device of claim 1 wherein the partition coefficient of the first absorbent layer and the second absorbent layer is 100 or greater as to between the substrate and the absorbent layers.

11. The device of claim 1 wherein the device is a single unit.

12. A method of passive vapor intrusion measurement, the method comprising:

applying a passive vapor sampling device according to claim 1 to the surface of a solid substrate, wherein the applying comprises substantially contacting the first absorbent layer of the device with the substrate surface and forming an adhesively sealed interface therewith, the adhesively sealed interface transversely surrounding the absorbent stack of the passive vapor sampling device;

allowing a selected period of time to elapse;

removing the passive vapor sampling device from the substrate surface;

collecting the first absorbent layer;

analyzing the amount of a selected analyte in the first absorbent layer;

calculating the vapor intrusion mass flux measured by the device based on the mass of compound absorbed, time of application, and size of exposed absorbent layer.

13. A method of passive vapor intrusion measurement, the method comprising:

applying a passive vapor sampling device according to claim 2 to the surface of a solid substrate, wherein the applying comprises substantially contacting the first absorbent layer of the device with the substrate surface and forming an adhesively sealed interface therewith, the adhesively sealed interface transversely surrounding the absorbent stack of the passive vapor sampling device;

allowing a selected period of time to elapse;

removing the passive vapor sampling device from the substrate surface;

collecting the first and second absorbent layers;

analyzing the amount of a selected analyte in the first absorbent layer;

analyzing the amount of the selected analyte in the second absorbent layer;

subtracting the amount of the compound in the first absorbent layer from the amount of the compound in the second absorbent layer; and

calculating the vapor intrusion mass flux measured by the device based on the mass of compound absorbed, time of application, and size of exposed absorbent layer.

14. The method of claim 12 wherein the selected period of time is about 10 minutes to one month.

15. The method of claim 13 wherein the selected period of time is about 10 minutes to one month.

16. The method of claim 12 wherein the substrate is a solid surface.

17. The method of claim 16 wherein the solid surface comprises concrete, cement, tile, or a combination of two or more thereof.

18. The method of claim 16 wherein the solid surface is a floor, slab, wall or ground surface.

19. The method of claim 13 wherein the substrate is a solid surface.

20. The method of claim 19 wherein the solid surface comprises concrete, cement, tile, or a combination of two or more thereof.