Method and system for noise mitigation in a multi-beam scanning electron microscopy system

• US 10,366,862 B2
• Filed: 09/16/2016
• Issued: 07/30/2019
• Est. Priority Date: 09/21/2015
• Status: Active Grant

• Current Assignee: KLA-Tencor Corporation
• Original Assignee: KLA-Tencor Corporation
• Inventors: Masnaghetti, Doug K., Simmons, Richard R., McCord, Mark A., Knippelmeyer, Rainer
• Primary Examiner(s): McCormack, Jason L
• Application Number:
  US15/267,223
• Publication Number:
  US 20170084423A1
• Time in Patent Office: 1,047 Days
• Field of Search: 250306, 250307, 250311
• CPC Class Codes: H01J 2237/0216 Means for avoiding or correcting vibration effects
• CPC Class Codes: H01J 2237/2817 Pattern inspection
• CPC Class Codes: H01J 37/09 Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
• CPC Class Codes: H01J 37/222 Image processing arrangements associated with the tube image data processing or generation, in general G06T
• CPC Class Codes: H01J 37/28 with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence

Abstract

A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.

Claims

1. A multi-beam scanning electron microscopy apparatus comprising:

a multi-beam scanning electron microscopy sub-system comprising;

a multi-beam electron beam source configured to generate a plurality of electron beams;

a sample stage configured to secure a sample;

an electron-optical assembly including a set of electron-optical elements configured to direct at least a portion of the plurality of electron beams onto a portion of the sample; and

a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams, wherein a first image contains a first instance of a pattern element obtained from a first location of the sample and at least an additional image contains an additional instance of the pattern element at an additional location of the sample; and

a controller including one or more processors configured to execute a set of program instructions stored in memory for causing the one or more processors to;

receive the plurality of images from the detector assembly;

compare two or more of the images to identify one or more common positional noise components present in the two or more images; and

remove the identified one or more common positional noise components from one or more images of the plurality of images by shifting the one or more images by an amount equal in distance and opposite in direction to the one or more common positional noise components.

2. The apparatus of claim 1, wherein the controller is configured to compare two or more of the images to identify common intensity variation present in the two or more images.

3. The apparatus of claim 1, wherein the set of electron-optical elements comprise:

at least one of a condenser lens or objective lens.

4. The apparatus of claim 1, wherein the multi-beam electron beam source comprises:

a field emission electron gun configured to generate an electron beam; and

a multi-beam aperture plate configured to split the electron beam from the field emission electron gun into the plurality of electron beams.

5. The apparatus of claim 1, wherein the multi-beam electron beam source comprises:

two or more electron guns.

6. The apparatus of claim 1, wherein the detector assembly comprises:

a detector array.

7. The apparatus of claim 1, wherein the detector assembly comprises:

one or more secondary electron detectors.

8. The apparatus of claim 1, wherein the detector assembly comprises:

one or more backscattered electron detectors.

9. A method comprising:

simultaneously acquiring a plurality of images with a multi-beam scanning electron microscopy system, wherein a first image contains a first instance of a pattern element obtained from a first location of the sample and at least an additional image contains an additional instance of the pattern element at an additional location of the sample;

comparing two or more of the images to identify common positional noise components present in the two or more images; and

removing the identified common positional noise components from one or more images of the plurality of images by shifting the one or more images by an amount equal in distance and opposite in direction to the common positional noise components.