X-ray inspection apparatus

• US 10,393,675 B2
• Filed: 04/03/2015
• Issued: 08/27/2019
• Est. Priority Date: 04/04/2014
• Status: Active Grant

• Current Assignee: Nordson Corporation
• Original Assignee: Nordson Corporation
• Inventors: Tingay, John, Walker, William T., King, Phil, White, Simon, Donaldson-Stewart, Kate
• Primary Examiner(s): Thomas, Courtney D
• Application Number:
  US15/300,775
• Publication Number:
  US 20170025317A1
• Time in Patent Office: 1,607 Days
• Field of Search: 378 58, 378 62
• CPC Class Codes: G01N 2223/309 support of sample holder
• CPC Class Codes: G01N 2223/6113 printed circuit board [PCB]
• CPC Class Codes: G01N 2223/6116 semiconductor wafer
• CPC Class Codes: G01N 2223/6462 microdefects
• CPC Class Codes: G01N 23/04 and forming images of the material
• CPC Class Codes: H01L 21/67288 Monitoring of warpage, curvature, damage, defects or the like
• CPC Class Codes: H01L 21/681 using optical controlling means
• CPC Class Codes: H01L 21/6838 with gripping and holding devices using a vacuum; Bernoulli devices
• CPC Class Codes: H01L 22/12 for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions electrical measurement of diffusions H01L22/14

Abstract

An x-ray inspection system including a cabinet containing an x-ray source, a sample support for supporting a sample to be inspected, and an x-ray detector; an air mover configured to force air into the cabinet through an air inlet above the sample support, where the air mover and cabinet are configured to force air through the cabinet from the air inlet past the sample support to an air outlet in the cabinet below the sample support, and an assembly for positioning the sample support relative to the x-ray source and x-ray detector. The sample support includes an upper surface extending in a horizontal plane and the sample positioning assembly includes a vertical positioning mechanism for moving the sample support in a vertical direction, orthogonal to the horizontal plane, and a first horizontal positioning mechanism for moving the sample support and vertical positioning mechanism in a first horizontal direction.

Claims

1. An x-ray inspection system, comprising:

a cabinet, the cabinet containing an x-ray source, a sample support for supporting a sample to be inspected, and an x-ray detector;

an air mover configured to force air into the cabinet through an air inlet in the cabinet above the sample support, wherein the air mover and the cabinet are configured to force air through the cabinet from the air inlet past the sample support to an air outlet in the cabinet below the sample support; and

a sample support positioning assembly for positioning the sample support relative to the x-ray source and the x-ray detector, wherein the sample support comprises an upper surface extending in a horizontal plane and wherein the sample support positioning assembly comprises a vertical positioning mechanism for moving the sample support in a vertical direction, orthogonal to the horizontal plane, and a first horizontal positioning mechanism for moving both the sample support and the vertical positioning mechanism in a first horizontal direction,

wherein the x-ray source is located above the sample support, and

wherein the air inlet comprises a labyrinthine air flow path.

2. The x-ray inspection system of claim 1, wherein the horizontal plane of the sample support is a first horizontal plane, further comprising a detector positioning assembly for positioning the x-ray detector relative to the x-ray source, wherein the detector positioning assembly comprises a horizontal detector positioning mechanism for moving the x-ray detector in at least two non-parallel directions within a second horizontal plane, and a detector tilting mechanism configured to allow the x-ray detector to be tilted from the second horizontal plane about at least two non-parallel axes.

3. The x-ray inspection system of claim 1, further comprising a proximity sensor fixed to the x-ray source and configured to provide a measurement of distance between the x-ray source and a surface of the sample on the sample support and a controller connected to the proximity sensor.

4. The x-ray inspection system of claim 1, further comprising:

a sample support position detection assembly comprising a non-contact position measuring device positioned adjacent to the sample support and configured to detect a position or a change in position of the sample support; and

an image processor connected to the x-ray detector and to the sample support position detection assembly.

5. The x-ray inspection system of claim 1, wherein the air outlet includes a labyrinthine air flow path.

6. The x-ray inspection system of claim 1, wherein the air mover includes an x-ray shield arranged to prevent the escape of x-rays from the cabinet.

7. An x-ray inspection system, comprising:

a cabinet;

an x-ray source disposed in the cabinet;

a sample support disposed in the cabinet and configured to support a sample to be inspected, wherein the sample support comprises a support surface extending in a first horizontal plane;

an x-ray detector disposed in the cabinet and configured to detect x-rays that have passed through the sample such that an image of the sample is recorded;

a sample support positioning assembly disposed in the cabinet and configured to position the sample support relative to the x-ray source or the x-ray detector;

wherein the support sample positioning assembly comprises a vertical positioning mechanism for moving the sample support in a vertical direction, orthogonal to the first horizontal plane, and a first horizontal positioning mechanism for moving both the sample support and the vertical positioning mechanism in a first horizontal direction;

a detector positioning assembly disposed in the cabinet and configured to position the x-ray detector relative to the x-ray source, wherein the detector positioning assembly comprises a horizontal detector positioning mechanism for moving the x-ray detector in at least two non-parallel directions within a second horizontal plane, and a detector tilting mechanism configured to allow the x-ray detector to be tilted from the second horizontal plane about at least two non-parallel axes; and

an air mover configured to force air into the cabinet through an air inlet in the cabinet above the sample support, wherein the air mover and the cabinet are configured to force air through the cabinet from the air inlet past the sample support to an air outlet in the cabinet below the sample support,

wherein the x-ray source is located above the sample support, and

wherein the air inlet comprises a labyrinthine air flow path.

8. The x-ray inspection system of claim 7, further comprising a proximity sensor fixed to the x-ray source and configured to provide a measurement of distance between the x-ray source and a surface of the sample on the sample support and a controller connected to the proximity sensor.

9. The x-ray inspection system of claim 7, further comprising:

a sample support position detection assembly comprising a non-contact position measuring device positioned adjacent to the sample support and configured to detect a position or a change in position of the sample support; and

an image processor connected to the x-ray detector and to the sample support position detection assembly.

10. The x-ray inspection system of claim 7, wherein the air outlet includes a labyrinthine air flow path.

11. An x-ray inspection system, comprising:

a cabinet;

an x-ray source disposed in the cabinet;

a sample support disposed in the cabinet and configured to support a sample to be inspected, wherein the sample support comprises a support surface extending in a first horizontal plane;

an x-ray detector disposed in the cabinet;

a sample support positioning assembly disposed in the cabinet and configured to position the sample support relative to the x-ray source or the x-ray detector;

wherein the sample support positioning assembly comprises a vertical positioning mechanism for moving the sample support in a vertical direction, orthogonal to the first horizontal plane, and a first horizontal positioning mechanism for moving both the sample support and the vertical positioning mechanism in a first horizontal direction;

a sample support position detection assembly disposed in the cabinet and comprising a non-contact position measuring device positioned adjacent to the sample support and configured to detect a position or a change in position of the sample support; and

an image processor connected to the x-ray detector and to the sample support position detection assembly;

a proximity sensor fixed to the x-ray source and configured to provide a measurement of distance between the x-ray source and a surface of the sample on the sample support and a controller connected to the proximity sensor; and

an air mover configured to force air into the cabinet through an air inlet in the cabinet above the sample support, wherein the air mover and the cabinet are configured to force air through the cabinet from the air inlet past the sample support to an air outlet in the cabinet below the sample support,

wherein the air inlet comprises a labyrinthine air flow path.

12. The x-ray inspection system of claim 11, further comprising a detector positioning assembly for positioning the x-ray detector relative to the x-ray source, wherein the detector positioning assembly comprises a horizontal detector positioning mechanism for moving the x-ray detector in at least two non-parallel directions within a second horizontal plane, and a detector tilting mechanism configured to allow the x-ray detector to be tilted from the second horizontal plane about at least two non-parallel axes.

13. An x-ray inspection system, comprising:

an x-ray source;

a sample support for supporting a sample to be inspected, wherein the sample support comprises a support surface extending in a first horizontal plane;

an x-ray detector;

a sample support positioning assembly that includes a first positioning mechanism for moving the sample support along a first axis towards and away from the x-ray source, and further comprising a proximity sensor fixed to the x-ray source and configured to provide a measurement of distance between the x-ray source and a surface of the sample on the sample support and a controller connected to the proximity sensor;

a sample support position detection assembly comprising a non-contact position measuring device positioned adjacent to the sample support and configured to detect a position or a change in position of the sample support; and

an image processor connected to the x-ray detector and to the sample support position detection assembly,

wherein the x-ray source is located above the sample support and the sample.

14. The x-ray inspection system of claim 13, further comprising:

a cabinet, the cabinet containing the x-ray source, the sample support, the sample support positioning assembly, the x-ray detector, and the sample support position detection assembly; and

an air mover configured to force air into the cabinet through an air inlet in the cabinet above the sample support, wherein the air mover and the cabinet are configured to force air through the cabinet from the air inlet past the sample support to an air outlet in the cabinet below the sample support.

15. The x-ray inspection system of claim 13, further comprising a detector positioning assembly for positioning the x-ray detector relative to the x-ray source, wherein the detector positioning assembly comprises a horizontal detector positioning mechanism for moving the x-ray detector in at least two non-parallel directions within a second horizontal plane, and a detector tilting mechanism configured to allow the x-ray detector to be tilted from the second horizontal plane about at least two non-parallel axes.

16. An x-ray inspection system, comprising:

a cabinet;

an x-ray source within the cabinet;

a wafer support within the cabinet configured to support a semiconductor wafer to be inspected;

a wafer support positioning assembly for positioning the wafer support relative to the x-ray source;

an x-ray detector within the cabinet;

a detector positioning assembly for positioning the x-ray detector relative to the x-ray source;

a wafer loading and unloading assembly configured to transport wafers from outside of the cabinet to the wafer support, and from the wafer support out of the cabinet;

a controller configured to control operation of the x-ray source, the wafer support positioning assembly, the detector positioning assembly and the wafer loading and unloading assembly; and

an image processor configured to process image data received from the x-ray detector, the image data relating to x-rays that have passed through the wafer,

wherein the x-ray source is located above the wafer support and the wafer.

17. The x-ray inspection system according to claim 16, further comprising at least one fan filter unit configured to force air through the cabinet from an air inlet above the wafer support to an air outlet below the wafer support.

18. The x-ray inspection system according to claim 16, further comprising a wafer support position detection assembly separate to the wafer support positioning assembly and configured to determine a position of the wafer support.

19. The x-ray inspection system according to claim 16, wherein the x-ray source is a sealed x-ray tube with a transmission target.

20. A method of imaging a semiconductor wafer using an x-ray inspection system, the method comprising:

activating an air mover configured to move air into the x-ray inspection system through an air inlet having a labyrinthine air flow path and through the x-ray inspection system;

loading the wafer into the x-ray inspection system;

positioning the wafer in an initial imaging position within the x-ray inspection system;

capturing an x-ray image of a region of interest of the wafer in the initial imaging position;

moving the wafer to a second imaging position;

capturing another x-ray image of a region of interest of the wafer in the second imaging position; and

unloading the wafer from the x-ray inspection system.

21. The method according to claim 20, further comprising performing a tomosynthesis calculation using the captured x-ray images.

22. The method according to claim 20, wherein the x-ray inspection system comprises an x-ray source and a sample support that is movable relative to the x-ray source, and wherein the step of positioning the wafer in the initial imaging position comprises scanning a surface of the wafer to determine how close the sample support can be brought to the x-ray source without a collision occurring between the x-ray source and the wafer.

23. The method according to claim 20, wherein the x-ray inspection system comprises an x-ray source and a sample support that is movable relative to the x-ray source, further comprising measuring a position of the sample support relative to the x-ray source using a non-contact position measuring device in each imaging position.

24. A method of imaging a sample that is supported on any sample support using an x-ray inspection system that has an x-ray tube located above the sample support, the method comprising:

using a distance sensor that detects the distance between the sample and the x-ray tube to prevent the sample from being positioned too close to the x-ray tube;

activating the x-ray tube and recording x-ray projections of a plurality of different regions of interest on the sample by a detector that is configured to detect x-rays that have passed through the sample; and

utilizing input from the distance sensor in image magnification calculations.