UV pretreatment apparatus used in vacuum evaporation
First Claim
Patent Images
1. A ultraviolet (UV) pretreatment apparatus used in vacuum evaporation, comprising:
- a housing having a curing chamber disposed inside the housing;
a base disposed in the curing chamber and disposed on a bottom face of the curing chamber, configured to support a thin film transistor (TFT) array substrate that is to be processed using UV;
an inlet disposed at one end of the housing and an outlet disposed at an opposite end of the housing;
a UV source disposed in the curing chamber; and
a light absorption layer is disposed on inner walls of the curing chamber;
wherein the UV source is disposed on a top face of the curing chamber and the light absorption layer is disposed on the bottom face and lateral faces of the curing chamber.
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Accused Products
Abstract
A ultraviolet (UV) pretreatment apparatus used in vacuum evaporation includes a housing having a curing chamber disposed inside the housing; an inlet disposed at one end of the housing and an outlet disposed at an opposite end of the housing; and a UV source disposed in the curing chamber. A light absorption layer is disposed on inner walls of the curing chamber.
4 Citations
15 Claims
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1. A ultraviolet (UV) pretreatment apparatus used in vacuum evaporation, comprising:
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a housing having a curing chamber disposed inside the housing; a base disposed in the curing chamber and disposed on a bottom face of the curing chamber, configured to support a thin film transistor (TFT) array substrate that is to be processed using UV; an inlet disposed at one end of the housing and an outlet disposed at an opposite end of the housing; a UV source disposed in the curing chamber; and a light absorption layer is disposed on inner walls of the curing chamber; wherein the UV source is disposed on a top face of the curing chamber and the light absorption layer is disposed on the bottom face and lateral faces of the curing chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A ultraviolet (UV) pretreatment apparatus used in vacuum evaporation, comprising:
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a housing having a curing chamber disposed inside the housing; a base disposed in the curing chamber and disposed on a bottom face of the curing chamber, configured to support a thin film transistor (TFT) array substrate that is to be processed using UV; an inlet disposed at one end of the housing and an outlet disposed at an opposite end of the housing; a UV source disposed in the curing chamber; and a light absorption layer is disposed on inner walls of the curing chamber. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A ultraviolet (UV) pretreatment apparatus used in vacuum evaporation, comprising:
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a housing having a curing chamber disposed inside the housing; an inlet disposed at one end of the housing and an outlet disposed at an opposite end of the housing; a UV source disposed in the curing chamber; a base is disposed in the curing chamber, configured to support a thin film transistor (TFT) array substrate that is to be processed using the UV source; and a light absorption layer is disposed on inner walls of the curing chamber, wherein the TFT array substrate comprises; a glass substrate; a light shielding pattern formed on a surface of the glass substrate; a buffer layer fabricated on the surface of the glass substrate and covering the light shielding pattern; TFT devices disposed on a surface of the buffer layer and disposed corresponding to the light shielding pattern; an insulating layer fabricated on the surface of the buffer layer and covering the TFT devices; a passivation layer fabricated on a surface of the insulating layer; a flattened layer fabricated on a surface of the passivation layer; and an anode metal pattern fabricated on a surface of the flattened layer, wherein the TFT array substrate is close to the UV source at one side having the anode metal pattern disposed.
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Specification