Method for fabricating magnetic core
First Claim
1. A method for fabricating a magnetic core, comprising:
- depositing a magnetic layer on a dielectric layer;
forming a first photoresist layer on the magnetic layer and patterning the first photoresist layer;
etching the magnetic layer through the patterned first photoresist layer, wherein a first section of the magnetic layer exposed by the patterned first photoresist layer remains on the dielectric layer after etching the magnetic layer;
removing the patterned first photoresist layer;
forming a second photoresist layer on the magnetic layer and patterning the second photoresist layer such that the patterned second photoresist layer has a curve portion;
etching the magnetic layer through the patterned second photoresist layer such that the curve portion of the patterned second photoresist layer suspends without support above the magnetic layer; and
removing the patterned second photoresist layer.
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Accused Products
Abstract
A method for fabricating a magnetic core includes depositing a magnetic layer on a dielectric layer, forming a first photoresist layer on the magnetic layer and patterning the first photoresist layer, etching the magnetic layer through the patterned first photoresist layer, in which a first section of the magnetic layer exposed by the first photoresist layer remains on the dielectric layer after the magnetic layer is etched, removing the patterned first photoresist layer, forming a second photoresist layer on the magnetic layer and patterning the second photoresist layer, etching the magnetic layer through the patterned second photoresist layer, and removing the second photoresist layer.
11 Citations
20 Claims
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1. A method for fabricating a magnetic core, comprising:
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depositing a magnetic layer on a dielectric layer; forming a first photoresist layer on the magnetic layer and patterning the first photoresist layer; etching the magnetic layer through the patterned first photoresist layer, wherein a first section of the magnetic layer exposed by the patterned first photoresist layer remains on the dielectric layer after etching the magnetic layer; removing the patterned first photoresist layer; forming a second photoresist layer on the magnetic layer and patterning the second photoresist layer such that the patterned second photoresist layer has a curve portion; etching the magnetic layer through the patterned second photoresist layer such that the curve portion of the patterned second photoresist layer suspends without support above the magnetic layer; and removing the patterned second photoresist layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for fabricating a magnetic core, comprising:
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depositing a magnetic layer over a dielectric layer; forming a first patterned photoresist layer over the magnetic layer, wherein a first section of the magnetic layer is exposed by the first patterned photoresist layer, and a second section of the magnetic layer is covered by the first patterned photoresist layer; etching the first section of the magnetic layer through the first patterned photoresist layer; forming a second patterned photoresist layer over the magnetic layer, wherein the first section of the magnetic layer is exposed by the second patterned photoresist layer, and the second section of the magnetic layer is covered by the second patterned photoresist layer; and etching again the first section of the magnetic layer through the second patterned photoresist layer. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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17. A method for fabricating a magnetic core, comprising:
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depositing a magnetic layer over a dielectric layer; etching the magnetic layer, such that the magnetic layer having a pair of first sections and a second section between the first sections, and the second section is thicker than the first sections; forming a first patterned photoresist layer over the second section, wherein the first sections are exposed by the first patterned photoresist layer; etching the first sections through the first patterned photoresist layer such that at least one of the first sections has a convex sidewall; and removing the first patterned photoresist layer. - View Dependent Claims (18, 19, 20)
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Specification