Active matrix organic light emitting diode back plate for display device and method for manufacturing the same
First Claim
1. A method for manufacturing an AMOLED back plate, comprising:
- forming source and drain electrodes on a substrate having a light shielding layer and a buffer layer covering the light shielding layer formed thereon, by a patterning process, wherein the source and drain electrodes are on the buffer layer;
depositing an active layer film and a gate insulating layer film sequentially, and forming an active layer, a gate insulating layer and a second via hole by a patterning process, wherein the active layer covers at least a part of a s urface of the source and drain electrodes, the surface being at a side of the source and drain electrodes which is farther away from the substrate, and the gate insulating layer is on the active layer; and
forming a gate electrode and a transparent anode sequentially, wherein the transparent anode is arranged in a light emitting area and connected with one of the source and drain electrodes through the second via hole; and
the gate electrode is on the gate insulating layer;
wherein the gate electrode is covered by a transparent conducting film, and the gate electrode is in direct contact with the transparent conducting film.
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Accused Products
Abstract
The present disclosure provides an AMOLED back plate and a method for manufacturing the same. The manufacturing method includes: forming source and drain electrodes and a first via hole on a substrate having a light shielding layer and a buffer layer formed thereon, by a patterning process; depositing an active layer film and a gate insulating layer film sequentially, and forming an active layer, a gate insulating layer and a second via hole by a patterning process, wherein the active layer connected with the light shielding layer by the first via hole; forming a gate electrode and a transparent anode sequentially, wherein the transparent anode is arranged in a light emitting area and connected with one of the source and drain electrodes through the second via hole.
6 Citations
18 Claims
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1. A method for manufacturing an AMOLED back plate, comprising:
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forming source and drain electrodes on a substrate having a light shielding layer and a buffer layer covering the light shielding layer formed thereon, by a patterning process, wherein the source and drain electrodes are on the buffer layer; depositing an active layer film and a gate insulating layer film sequentially, and forming an active layer, a gate insulating layer and a second via hole by a patterning process, wherein the active layer covers at least a part of a s urface of the source and drain electrodes, the surface being at a side of the source and drain electrodes which is farther away from the substrate, and the gate insulating layer is on the active layer; and forming a gate electrode and a transparent anode sequentially, wherein the transparent anode is arranged in a light emitting area and connected with one of the source and drain electrodes through the second via hole; and
the gate electrode is on the gate insulating layer;wherein the gate electrode is covered by a transparent conducting film, and the gate electrode is in direct contact with the transparent conducting film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. An AMOLED back plate, comprising:
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a substrate; a light shielding layer arranged on the substrate; a buffer layer covering the light shielding layer; source and drain electrodes arranged on the buffer layer; an active layer, wherein the active layer covers at least a part of a surface of the source and drain electrodes, the surface being at a side of the source and drain electrodes which is farther away from the substrate; a gate insulating layer arranged on the active layer; a gate electrode arranged on the gate insulating layer; and a transparent anode, wherein the transparent anode is arranged in a light emitting area and connected with one of the source and drain electrodes through a second via hole; wherein the gate electrode is covered by a transparent conducting film, and the gate electrode is in direct contact with the transparent conducting film. - View Dependent Claims (13, 14, 15, 16, 17, 18)
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Specification