Electromagnetic wave treatment of a substrate at microwave frequencies using a wave resonator

• US 10,522,384 B2
• Filed: 08/29/2016
• Issued: 12/31/2019
• Est. Priority Date: 09/23/2015
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Vukovic, Mirko
• Primary Examiner(s): Abraham, Ibrahime A
• Assistant Examiner(s): Sims, Elizabeth M
• Application Number:
  US15/250,110
• Publication Number:
  US 20170084462A1
• Time in Patent Office: 1,219 Days
• Field of Search: None
• CPC Class Codes: H01L 21/324 Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering H01L21/20 - H01L21/288 and H01L21/302 - H01L21/322 take precedence
• CPC Class Codes: H01L 21/67115 mainly by radiation
• CPC Class Codes: H01L 21/68714 the wafers being placed on a susceptor, stage or support
• CPC Class Codes: H01P 1/182 Waveguide phase-shifters H01P1/181, H01P1/185, H01P1/19 take precedence
• CPC Class Codes: H01P 1/38 Circulators
• CPC Class Codes: H01P 3/12 Hollow waveguides H01P3/20 takes precedence
• CPC Class Codes: H01P 7/06 Cavity resonators
• CPC Class Codes: H01Q 13/22 Longitudinal slot in boundary wall of waveguide or transmission line H01Q13/203 takes precedence
• CPC Class Codes: H01Q 21/0043 Slotted waveguides combination with horns H01Q13/0233

Abstract

A processing system is disclosed, having a process chamber that houses a substrate for exposure of a surface of the substrate to a travelling electromagnetic (EM) wave. The processing system also includes an EM wave transmission antenna configured to launch the travelling EM wave into the process chamber for the travelling EM wave to propagate in a direction substantially parallel to the surface of the substrate. The processing system also includes a power coupling system configured to supply EM energy into the EM wave transmission antenna to generate the travelling EM wave at a prescribed output power and in a prescribed EM wave mode during treatment of the substrate. The EM wave is recycled in the processing system in order to increase the efficiency of the microwave power use and eliminate the complexity of the resistive load cooling.

Claims

1. A processing system for electromagnetic (EM) wave treatment of a substrate, comprising:

an EM wave generation circuit including an EM wave generator configured to generate an EM wave at a prescribed output power and a prescribed wave mode, and a first waveguide coupled with the EM wave generator;

a standing wave circuit (SWC) coupled to the EM wave generation circuit and configured to reflect back or allow an EM wave to pass through, the standing wave circuit including an impedance matcher coupled to the first waveguide and configured to allow an EM wave proceeding in one direction from the EM wave generator and from the first waveguide to pass through and to reflect back an EM wave proceeding in another direction opposite the one direction;

a travelling wave circuit (TWC) coupled to the standing wave circuit and including;

a circulator configured to redirect a flow of the travelling EM wave and generate a travelling EM wave, the circulator coupled with the standing wave circuit;

a process chamber coupled with the circulator to receive the traveling EM wave and configured to house a substrate for exposure of a surface of the substrate to the travelling EM wave;

a waveguide configuration for directing the traveling EM wave into and out of the process chamber and back through the circulator;

a phase shifter coupled within the waveguide configuration and configured and positioned to affect the traveling EM wave and maintain an integer number of wavelengths in the traveling wave circuit;

the standing wave circuit configured for reflecting back an EM wave from the circulator in the traveling wave circuit that is directed toward the standing wave circuit;

wherein the travelling EM wave is recirculated through the travelling wave circuit (TWC) and the process chamber thereby reducing the power usage and eliminating the need for a resistive load device to unload the travelling EM wave.

2. The processing system of claim 1, wherein the EM wave generator is configured to generate the EM wave at a microwave frequency in a range of 1 GHz to 10 GHz or in a range from 0.10 to 0.99 GHz.

3. The processing system of claim 1, wherein the substrate surface is at or below 400 degrees C.

4. The processing system of claim 1, wherein the travelling wave circuit further comprises:

a waveguide configuration that includes a fourth waveguide, a fifth waveguide, a sixth waveguide, and a seventh waveguide;

wherein the fourth waveguide is oriented for the travelling EM wave to exit the circulator and bend left substantially 90 degrees prior to entering the process chamber in a direction substantially parallel to the surface of the substrate,

wherein the fifth waveguide is oriented for the travelling EM wave exit straight out of the process chamber, to proceed straight then bend left substantially 90 degrees, continue straight, and bend another left substantially 90 degrees prior to entering into the sixth waveguide;

wherein the sixth waveguide is oriented for the travelling EM wave to proceed straight and enter the phase shifter; and

wherein the seventh waveguide is oriented for the travelling EM wave to exit the phase shifter, proceed straight and enter circulator.

5. The processing system of claim 1, wherein:

the impedance matcher is tuned such that the EM wave and EM energy thereof is passed through so that less than 20% of the EM energy is reflected back to the EM wave generator.

6. The processing system of claim 1 wherein the standing wave circuit and travelling wave circuit functions as a ring resonator to recirculate the EM energy over the substrate in order to reduce costs of ownership of the EM wave generator.

7. The processing system of claim 1 further comprising a plurality of operating systems including a power coupling system, a vacuum system, an electrostatic clamping system, a gas supply system, a controller coupled to the process chamber, the controller configured to control at least one of the operating systems of the processing system in order to meet EM treatment objectives.

8. A processing system for electromagnetic (EM) wave treatment of a substrate, the processing system comprising:

an EM wave generation circuit including an EM wave generator configured to generate an EM wave at a prescribed output power and a prescribed wave mode, and a first waveguide coupled with the EM wave generator;

a standing wave circuit coupled to the EM wave generation circuit and configured to reflect back or allow an EM wave to pass through, the standing wave circuit including a first impedance matcher coupled to the EM wave generation circuit and configured to allow an EM wave proceeding in one direction from the EM wave generation circuit to pass through and to reflect back an EM wave proceeding in another direction opposite the one direction;

a standing wave resonator coupled to the standing wave circuit, the standing wave resonator configured to generate a travelling EM wave and recirculate the travelling EM wave, the standing wave resonator including;

a circulator configured to redirect a flow of the travelling EM wave, the circulator coupled with the standing wave circuit;

a slot wave antenna coupled with the circulator and configured to propagate a travelling EM wave; and

a first phase shifter coupled with the circulator and configured to affect the traveling EM wave and maintain an integer number of wavelengths in the standing wave resonator;

the standing wave circuit configured for reflecting back an EM wave from the circulator in the traveling wave circuit that is directed toward the standing wave circuit; and

a loop-back travelling wave circuit coupled to the standing wave resonator and including;

a process chamber coupled to the slot wave antenna to receive the traveling EM wave and configured to house a substrate for exposure of a surface of the substrate to the travelling EM wave;

a waveguide configuration for directing the traveling EM wave out of the process chamber and back through the standing wave resonator;

a second impedance matcher coupled with the waveguide configuration and configured to reflect back or allow an EM wave to pass through;

a second phase shifter coupled with the waveguide configuration and configured to affect the traveling EM wave and maintain an integer number of wavelengths exist in the loop-back travelling wave circuit;

wherein the travelling EM wave is transmitted through the standing wave circuit and into the standing wave resonator and wherein the travelling EM wave propagates in a direction substantially parallel to a surface of the substrate.

9. The processing system of claim 8, wherein the EM wave generator is configured to generate the EM wave at a microwave frequency in a range of 1 GHz to 10 GHz or in a range from 0.10 to 0.99 GHz.

10. The processing system of claim 8, the standing wave circuit further comprising:

a second waveguide coupled to the first impedance matcher and the circulator.

11. The processing system of claim 8, wherein:

the first impedance matcher is tuned such that the EM wave and EM energy thereof is passed through so that less than 20% of the EM energy is reflected back to the EM generator.

12. The processing system of claim 8, wherein the travelling wave circuit, the standing wave resonator, and the loop-back travelling wave circuit function as a resonator to recirculate the EM energy over the substrate in order to reduce costs of the EM wave generator.

13. The processing system of claim 8, wherein the substrate surface is at or below 400 degrees.

14. The processing system of claim 8, wherein the standing wave resonator and loop-back travelling wave circuit recirculate the EM energy in order to reduce costs of ownership of the EM wave generator.