Array substrate with via holes having gradually decreased areas, photomask for manufacturing array substrate, and display device comprising array substrate

• US 10,553,615 B2
• Filed: 05/25/2017
• Issued: 02/04/2020
• Est. Priority Date: 04/26/2017
• Status: Active Grant

• Current Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd. (TCL Technology Group Corp.)
• Original Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd. (TCL Technology Group Corp.)
• Inventors: Zhao, Kaixiang
• Primary Examiner(s): Williams, Alexander O
• Application Number:
  US15/539,810
• Publication Number:
  US 20180358382A1
• Time in Patent Office: 985 Days
• Field of Search: 257 72
• CPC Class Codes: G02F 1/136227 Through-hole connection of the pixel electrode to the active element through an insulation layer
• CPC Class Codes: G02F 2201/121 common or background
• CPC Class Codes: G02F 2201/123 pixel
• CPC Class Codes: G03F 1/00 Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
• CPC Class Codes: G06F 3/0412 Digitisers structurally integrated in a display
• CPC Class Codes: G06F 3/04164 Connections between sensors and controllers, e.g. routing lines between electrodes and connection pads
• CPC Class Codes: G06F 3/047 using sets of wires, e.g. crossed wires
• CPC Class Codes: H01L 27/124 with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits wiring structures per se H01L23/52
• CPC Class Codes: H01L 27/1248 with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
• CPC Class Codes: H01L 27/1288 employing particular masking sequences or specially adapted masks, e.g. half-tone mask
• CPC Class Codes: H01L 29/78633 with a light shield
• CPC Class Codes: H01L 29/78675 with normal-type structure, e.g. with top gate

Abstract

Provided is an array substrate, a photomask, and a display device. The array substrate includes a substrate, a common electrode layer on which a plurality of first via holes are provided at predetermined positions, a passivation layer having a plurality of second via holes disposed concentrically with the first via holes, and a pixel electrode layer having a plurality of pixel electrodes. Areas of the first via holes are configured to gradually decrease in the direction from an output proximal end to an output distal end of a gate line.

Claims

1. An array substrate, comprising:

a substrate, which comprises switching elements and gate lines;

a common electrode layer arranged on the substrate and provided with a common electrode, wherein a plurality of first via holes are provided at predetermined positions on the common electrode layer;

a passivation layer arranged on the common electrode layer and having a plurality of second via holes disposed concentrically with the first via holes; and

a pixel electrode layer arranged on the passivation layer and provided with a plurality of pixel electrodes connected to the switching element through corresponding second via holes;

wherein, areas of the first via holes are configured to gradually decrease in a direction along an output proximal end to an output distal end of the gate line.

2. The array substrate according to claim 1, further comprising:

a dielectric layer arranged on the common electrode layer; and

a touch wiring layer arranged on the dielectric layer and provided thereon with the passivation layer.

3. The array substrate according to claim 2, wherein the common electrode is configured to serve as a touch electrode and is connected with some wires in the touch wiring layer.

4. The array substrate according to claim 1, wherein the switching element comprises:

a channel layer arranged on the substrate and including a plurality of conductive channels;

a first insulating layer arranged on the channel layer;

a first conductive layer which is arranged on the first insulating layer and is configured to correspond to the conductive channel, the first conductive layer including a gate of the switching element;

a second insulating layer arranged on the first conductive layer and the exposed first insulating layer;

a second conductive layer arranged on the second insulating layer and including a source and a drain of the switching element, for connecting the channel layer; and

a flat layer arranged on the second conductive layer and the exposed second insulating layer and provided thereon with the common electrode layer.

5. The array substrate according to claim 4, wherein the channel layer is made of a low-temperature poly-silicon material and further comprises heavily ion-doped regions disposed at both ends of the conductive channel, the ion heavily doped region comprising a drain region connected with a drain of the switching element, and a source region connected with a source of the switching element.

6. The array substrate according to claim 5, wherein a slightly ion-doped region is provided between the conductive channel and the heavily ion-doped region.

7. The array substrate according to claim 6, further comprising a shading layer which is disposed on the substrate and is configured to correspond to the conductive channel.

8. The array substrate according to claim 7, further comprising a third insulating layer arranged on the shading layer and the exposed substrate and provided thereon with the channel layer.

19. The array substrate according to claim 2, wherein the dielectric layer is arranged between the touching wiring layer and the common electrode layer and configured to space the common electrode layer from the touch wiring layer;

the touching wiring layer comprises a first wiring line and a second wiring line spaced apart from the first wiring line;

the first wiring line is connected with the common electrode;

the second wiring line is spaced apart and insulated from the common electrode layer by using the dielectric layer.

9. A photomask used for manufacturing an array substrate, and the array substrate comprising:

a substrate, which comprises gate lines;

a common electrode layer arranged on the substrate and provided with a common electrode, wherein a plurality of first via holes are provided at predetermined positions on the common electrode layer;

wherein the photomask is provided with light transmitting regions corresponding to the plurality of first via holes, and areas of the light transmitting regions are configured to gradually decrease in the direction along an output proximal end to the output distal end of the gate line on the substrate.

10. A display device comprising an array substrate, wherein the array substrate comprises:

a substrate, which comprises switching elements and gate lines;

a common electrode layer arranged on the substrate and provided with a common electrode, wherein a plurality of first via holes are provided at predetermined positions on the common electrode layer;

a passivation layer arranged on the common electrode layer and having a plurality of second via holes disposed concentrically with the first via holes; and

a pixel electrode layer arranged on the passivation layer and provided with a plurality of pixel electrodes connected to the switching element through the corresponding second via holes;

wherein, areas of the first via holes are configured to gradually decrease in the direction along an output proximal end to an output distal end of the gate line.

11. The display device according to claim 10, further comprising:

a dielectric layer arranged on the common electrode layer; and

a touch wiring layer arranged on the dielectric layer and provided thereon with the passivation layer.

12. The display device according to claim 11, wherein the common electrode is configured to serve as a touch electrode and is connected with some wires in the touch wiring layer.

13. The display device according to claim 10, wherein the switching element comprises:

a channel layer arranged on the substrate and including a plurality of conductive channels;

a first insulating layer arranged on the channel layer;

a first conductive layer which is arranged on the first insulating layer and is configured to correspond to the conductive channel, the first conductive layer including a gate of the switching element;

a second insulating layer arranged on the first conductive layer and the exposed first insulating layer;

a second conductive layer arranged on the second insulating layer and including a source and a drain of the switching element for connecting the channel layer; and

a flat layer arranged on the second conductive layer and the exposed second insulating layer and provided thereon with the common electrode layer.

14. The display device according to claim 13, wherein the channel layer is made of a low-temperature poly-silicon material and further comprises heavily ion-doped regions disposed at both ends of the conductive channel, the ion heavily doped region comprising a drain region connected with the drain of the switching element, and a source region connected with the source of the switching element.

15. The display device according to claim 14, wherein a slightly ion-doped region is provided between the conductive channel and the heavily ion-doped region.

16. The display device according to claim 15, further comprising a shading layer which is arranged on the substrate and is configured to correspond to the conductive channel.

17. The display device according to claim 16, further comprising a third insulating layer arranged on the shading layer and the exposed substrate and provided thereon with the channel layer.

18. The display device according to claim 11, wherein the dielectric layer is arranged between the touching wiring layer and the common electrode layer and configured to space the common electrode layer from the touch wiring layer;

the touching wiring layer comprises a first wiring line and a second wiring line spaced apart from the first wiring line;

the first wiring line is connected with the common electrode;

the second wiring line is spaced apart and insulated from the common electrode layer by using the dielectric layer.