Thin-film transistor structure and manufacturing method thereof, display panel and display device
First Claim
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1. A thin-film transistor structure, comprising:
- a base substrate; and
a first thin-film transistor and a second thin-film transistor, formed on the base substrate, whereina first active layer of the first thin-film transistor is doped with hydrogen;
a material of a second active layer of the second thin-film transistor is metal oxide; and
a first isolation barrier surrounding the first thin-film transistor and/or a second isolation barrier surrounding the second thin-film transistor are disposed on the base substrate.
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Abstract
Embodiment of the present disclosure provide a thin-film transistor structure, a manufacturing method thereof, a display panel and a display device. The thin-film transistor structure includes: a base substrate; and a first thin-film transistor and a second thin-film transistor formed on the base substrate, wherein a first active layer of the first thin-film transistor is doped with hydrogen; a material of a second active layer of the second thin-film transistor is metal oxide; and a first isolation barrier surrounding the first thin-film transistor and/or a second isolation barrier surrounding the second thin-film transistor are disposed on the base substrate.
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18 Claims
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1. A thin-film transistor structure, comprising:
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a base substrate; and a first thin-film transistor and a second thin-film transistor, formed on the base substrate, wherein a first active layer of the first thin-film transistor is doped with hydrogen;
a material of a second active layer of the second thin-film transistor is metal oxide; and
a first isolation barrier surrounding the first thin-film transistor and/or a second isolation barrier surrounding the second thin-film transistor are disposed on the base substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification