Polishing agent, polishing agent set, and substrate polishing method

  • US 10,557,058 B2
  • Filed: 02/14/2013
  • Issued: 02/11/2020
  • Est. Priority Date: 02/21/2012
  • Status: Active Grant
First Claim
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1. A polishing agent comprising:

  • water,abrasive grains containing a hydroxide of a tetravalent metal element,at least one polyalkylene glycol, andat least one cationic polymer selected from the group consisting of allylamine polymers, diallylamine polymers, vinylamine polymers and ethyleneimine polymers,wherein the abrasive grains produce absorbance of 1.000 or greater for light with a wavelength of 290 nm in an aqueous dispersion having the abrasive grain content adjusted to 0.0065 mass %.

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