Method for manufacturing spacers and method for manufacturing display substrate
First Claim
1. A method for manufacturing spacers, comprising:
- forming a photoresist layer on a substrate;
performing an exposure process on the photoresist layer using a mask plate;
performing an over-development process on the photoresist layer processed by the exposure process to form a first photoresist pattern and a second photoresist pattern on the substrate;
in a direction perpendicular to the substrate as a height direction, at a position of the same height, an area of a cross-section of the first photoresist pattern is greater than an area of a cross-section of the second photoresist pattern;
an outer edge of a lower portion of the first photoresist pattern near the substrate is provided with a recess, and an outer edge of a lower portion of the second photoresist pattern near the substrate is provided with a recess;
waiting a first duration for photoresist on a surface of the first photoresist pattern to flow downwards to fill the recess of the first photoresist pattern, and photoresist on a surface of the second photoresist pattern to flow downwards to fill the recess of the second photoresist pattern; and
post-baking the first photoresist pattern and the second photoresist pattern to form a first spacer and a second spacer, a height of the first spacer being greater than a height of the second spacer.
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Accused Products
Abstract
A method for manufacturing spacers and a method for manufacturing a display substrate are disclosed. The method for manufacturing spacers includes performing an over-development process on the photoresist layer processed by the exposure process to form a first photoresist pattern and a second photoresist pattern on the substrate; an outer edge of a lower portion of the first photoresist pattern near the substrate is provided with a recess, and an outer edge of a lower portion of the second photoresist pattern near the substrate is provided with a recess; waiting a first duration for photoresist on a surface of the first photoresist pattern to flow downwards to fill the recess of the first photoresist pattern, and photoresist on a surface of the second photoresist pattern to flow downwards to fill the recess of the second photoresist pattern.
7 Citations
20 Claims
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1. A method for manufacturing spacers, comprising:
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forming a photoresist layer on a substrate; performing an exposure process on the photoresist layer using a mask plate; performing an over-development process on the photoresist layer processed by the exposure process to form a first photoresist pattern and a second photoresist pattern on the substrate;
in a direction perpendicular to the substrate as a height direction, at a position of the same height, an area of a cross-section of the first photoresist pattern is greater than an area of a cross-section of the second photoresist pattern;
an outer edge of a lower portion of the first photoresist pattern near the substrate is provided with a recess, and an outer edge of a lower portion of the second photoresist pattern near the substrate is provided with a recess;waiting a first duration for photoresist on a surface of the first photoresist pattern to flow downwards to fill the recess of the first photoresist pattern, and photoresist on a surface of the second photoresist pattern to flow downwards to fill the recess of the second photoresist pattern; and post-baking the first photoresist pattern and the second photoresist pattern to form a first spacer and a second spacer, a height of the first spacer being greater than a height of the second spacer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification