Imprint apparatus, imprint method, and method for producing article

• US 10,642,171 B2
• Filed: 06/03/2016
• Issued: 05/05/2020
• Est. Priority Date: 06/10/2015
• Status: Active Grant

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Matsumoto, Takahiro, Kobayashi, Kenichi, Miyaharu, Takafumi, Murakami, Yosuke, Hayashi, Tatsuya
• Primary Examiner(s): Schiffman, Benjamin A
• Application Number:
  US15/173,339
• Publication Number:
  US 20160363874A1
• Time in Patent Office: 1,432 Days
• Field of Search: None
• CPC Class Codes: B29C 2059/023 Microembossing
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
• CPC Class Codes: G03F 9/7042 Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting non-exposure lithographic processes per se G03F7/0002
• CPC Class Codes: H01L 21/68 for positioning, orientation or alignment

Abstract

An imprint apparatus includes a substrate holding unit. A generation unit generates heating distribution data indicating distribution of a heat value to be applied to a region to be processed. A heating unit gives heat to the region to be processed to deform the region. An obtaining unit which obtains first information defined based on a difference of shapes of the region and a pattern portion of the mold, and second information about a deformation amount of the region. The second information is obtained, by trying deformation of the region to be processed by the heating unit while the substrate holding unit attracts the substrate. A patterning unit forms the pattern while the heating unit is deforming the region to be processed based on the heating distribution data generated, in which the generation unit generates the heating distribution data based on the obtained first and second information.

Claims

1. An imprint apparatus which forms a pattern in shot region on a substrate by using a mold and an imprint material, comprising:

a substrate holding unit which attracts and holds the substrate, attracting force of the substrate varies according to a position of the shot region on the substrate;

a generation unit which generates heating distribution data indicating distribution of a heat value to be applied to the shot region;

a heating unit which gives heat to the shot region to deform the shot region;

an obtaining unit which obtains first information defined based on a difference of shapes of the shot region and a pattern portion of the mold, and second information about a deformation amount of the shot region, the second information is set based on a position of the shot region on the substrate, the second information being obtained by trying deformation of the shot region by the heating unit while the substrate holding unit is-attracting a position corresponding to the shot region of the substrate; and

a patterning unit configured to form the pattern while the heating unit is deforming the shot region based on the heating distribution data generated by the generation unit, wherein

the generation unit generates the heating distribution data based on the first information and the second information which are obtained by the obtaining unit.

2. The imprint apparatus according to claim 1, wherein the first information is temporal heating distribution data temporarily generated based on the difference of the shapes, and the generation unit generates the heating distribution data by correcting the first information with a use of the second information.

3. The imprint apparatus according to claim 2, wherein the heating distribution data is data obtained by multiplying the temporal heating distribution data by a correction coefficient obtained from the second information.

4. The imprint apparatus according to claim 1, comprising a detection unit which detects a plurality of marks provided in the shot region in the trying deformation, wherein the obtaining unit obtains the second information based on change in positions of the marks detected by the detection unit.

5. The imprint apparatus according to claim 1, comprising

a plurality of attracting units each of which controls an attracting force of the substrate for each of a plurality of divided regions included in the substrate holding unit, and

the obtaining unit obtains a plurality of pieces of second information corresponding to different positions in the divided regions attracted by the plurality of common attracting units.

6. The imprint apparatus according to claim 1, wherein there are a plurality of regions to be processed on the substrate, and the generation unit generates, based on the same second information, the heating distribution data associated with two regions to be processed among the plurality of regions to be processed.

7. The imprint apparatus according to claim 1, wherein there are a plurality of regions to be processed on the substrate, and two regions to be processed, which are subjected to trying deformation, are at positions having different distances from a center of the substrate.

8. The imprint apparatus according to claim 1, wherein there are a plurality of regions to be processed on the substrate, and the second information is information applied to each of the plurality of regions to be processed.

9. The imprint apparatus according to claim 1, wherein the second information is information applied to each of the divided regions which are obtained by virtually dividing one shot region into a plurality of regions.

10. The imprint apparatus according to claim 1, wherein the heating unit has a light source for emitting light, and controls illumination of the light to apply a heat value corresponding to the heating distribution data to the shot region.

11. The imprint apparatus according to claim 1 forming a pattern on a plurality of substrates, wherein

the second information is information obtained when shot region on a first substrate in the same lot is thermally deformed, and the second information about the first substrate is applied to a substrate different from the first substrate.

12. The imprint apparatus according to claim 1, wherein the second information is information obtained by trying deformation of shot region on a standard substrate, and an operation of forming the pattern is performed for a substrate different from the standard substrate.

13. An imprint apparatus which forms a pattern in shot region on a substrate by using a mold and an imprint material, comprising:

a substrate holding unit which attracts and holds the substrate, attracting force of the substrate varies according to a position of the shot region on the substrate;

a plurality of attracting units each of which is able to control an attracting force of the substrate for each of a plurality of divided regions included in the substrate holding unit;

a generation unit which generates heating distribution data indicating distribution of a heat value to be applied to the region to be processed;

a heating unit which gives heat to the region to be processed to deform the shot region;

an obtaining unit which obtains first information defined based on a difference of shapes of the shot region and a pattern portion of the mold, and second information about a deformation amount of the shot region, the second information is set based on a position of the shot region on the substrate, the second information being obtained by trying deformation of the shot region by the heating unit while the substrate holding unit attracting a position corresponding to the shot region of the substrate; and

a patterning unit configured to form the pattern while the heating unit is deforming the shot region based on the heating distribution data generated by the generation unit, wherein

the obtaining unit obtains the second information corresponding to a plurality of different positions of the divided regions attracted by common attraction units, and

the generation unit generates the heating distribution data corresponding to the plurality of different positions based on the first information and each of the second information which are obtained by the obtaining unit.

14. An imprint apparatus which forms a pattern in shot region on a substrate by using a mold and an imprint material, comprising:

a substrate holding unit which attracts and holds the substrate, attracting force of the substrate varies according to a position of the shot region on the substrate; and

a heating unit which gives heat to the shot region to deform the shot region;

wherein

the heating unit deforms the shot region based on heating distribution data indicating distribution of a heat value to be applied to the shot region, that is generated based on first information defined based on a difference of shapes of the shot region and a pattern portion of the mold, and second information obtained by deforming the shot region with the heating unit while the substrate holding unit attracting a position corresponding to the shot region of the substrate, and

the second information at a first shot region on the substrate is different from the second information at a second shot region that is different from the first shot region on the substrate.

15. The imprint apparatus according to claim 14, wherein the first information is temporal heating distribution data temporarily generated based on the difference of the shapes, and the second information is a correction value of the temporal heating distribution data obtained from information regarding the position of the shot region on the substrate.

16. An imprint apparatus which forms a pattern in shot region on a substrate by using a mold and an imprint material, comprising:

a heating unit which gives heat to the shot region to deform the shot region; and

a substrate holding unit in which attracting force of the substrate varies according to a position of the shot region on the substrate,

wherein the heating unit deforms the shot region based on first information regarding a difference of shapes of the shot region and a pattern portion of the mold, and second information regarding the position of the shot region on the substrate, and

wherein the second information is set based on a position of the shot region on the substrate.

17. The imprint apparatus according to claim 16, wherein the heating unit gives heat to the shot region based on the heating distribution data obtained from the information regarding the difference of shapes of the shot region and a pattern portion of the mold and the correction value of the heating distribution data obtained from the second information.