Method and system for charged particle microscopy with improved image beam stabilization and interrogation
First Claim
Patent Images
1. A scanning electron microscopy apparatus comprising:
- an electron beam source configured to generate an electron beam;
a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of a sample;
an emittance analyzer assembly; and
a splitter element configured to direct at least a portion of at least one of secondary electrons or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly,wherein the emittance analyzer assembly is configured to image at least one of the secondary electrons or the backscattered electrons, wherein the emittance analyzer assembly includes;
a set of deflection optics;
a first electron-optic lens;
a first electron detector including a center aperture, wherein the first electron detector is configured to collect at least one of a portion of the secondary electrons or a portion of the backscattered electrons;
a first mesh element disposed downstream from the first electron detector;
a second mesh element disposed downstream from the first mesh element, wherein the first electron detector and the first mesh element form a deceleration region, wherein the first mesh element and the second mesh element form a drift region;
an energy filter disposed downstream from the second mesh element;
a second electron-optic lens; and
a second electron detector configured to collect at least one of an additional portion of the secondary electrons or an additional portion of the backscattered electrons.
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Abstract
A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.
60 Citations
28 Claims
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1. A scanning electron microscopy apparatus comprising:
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an electron beam source configured to generate an electron beam; a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of a sample; an emittance analyzer assembly; and a splitter element configured to direct at least a portion of at least one of secondary electrons or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly, wherein the emittance analyzer assembly is configured to image at least one of the secondary electrons or the backscattered electrons, wherein the emittance analyzer assembly includes; a set of deflection optics; a first electron-optic lens; a first electron detector including a center aperture, wherein the first electron detector is configured to collect at least one of a portion of the secondary electrons or a portion of the backscattered electrons; a first mesh element disposed downstream from the first electron detector; a second mesh element disposed downstream from the first mesh element, wherein the first electron detector and the first mesh element form a deceleration region, wherein the first mesh element and the second mesh element form a drift region; an energy filter disposed downstream from the second mesh element; a second electron-optic lens; and a second electron detector configured to collect at least one of an additional portion of the secondary electrons or an additional portion of the backscattered electrons. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. An emittance analyzer assembly comprising:
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a set of deflection optics; a first electron-optic lens; a first electron detector including a center aperture, wherein the first electron detector is configured to collect at least one of a portion of the secondary electrons or a portion of the backscattered electrons; a first mesh element disposed downstream from the first electron detector; a second mesh element disposed downstream from the first mesh element, wherein the first electron detector and the first mesh element form a deceleration region, wherein the first mesh element and the second mesh element form a drift region; an energy filter disposed downstream from the second ground mesh element; a second electron-optic lens; and a second electron detector configured to collect at least one of an additional portion of the secondary electrons or an additional portion of the backscattered electrons. - View Dependent Claims (23, 24, 25, 26)
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27. A system comprising:
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a first emittance analyzer assembly; and a second emittance analyzer assembly, wherein at least one of the first emittance analyzer assembly or the second emittance analyzer comprises; a set of deflection optics; a first electron-optic lens; a first electron detector including a center aperture, wherein the first electron detector is configured to collect at least one of a portion of the secondary electrons or a portion of the backscattered electrons; a first mesh element disposed downstream from the first electron detector; a second mesh element disposed downstream from the first mesh element, wherein the first electron detector and the first mesh element form a deceleration region, wherein the first mesh element and the second mesh element form a drift region; an energy filter disposed downstream from the second mesh element; a second electron-optic lens; and a second electron detector configured to collect at least one of an additional portion of the secondary electrons or an additional portion of the backscattered electrons.
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28. A system comprising:
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a first emittance analyzer assembly; a second emittance analyzer assembly; and a third emittance analyzer assembly, wherein at least one of the first emittance analyzer assembly, the second emittance analyzer assembly or the third emittance analyzer assembly comprises; a set of deflection optics; a first electron-optic lens; a first electron detector including a center aperture, wherein the first electron detector is configured to collect at least one of a portion of the secondary electrons or a portion of the backscattered electrons; a first mesh element disposed downstream from the first electron detector; a second mesh element disposed downstream from the first mesh element, wherein the first electron detector and the first mesh element form a deceleration region, wherein the first mesh element and the second mesh element form a drift region; an energy filter disposed downstream from the second mesh element; a second electron-optic lens; and a second electron detector configured to collect at least one of an additional portion of the secondary electrons or an additional portion of the backscattered electrons.
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Specification