Display panel, method for manufacturing the display panel and display apparatus

• US 10,725,357 B2
• Filed: 05/12/2017
• Issued: 07/28/2020
• Est. Priority Date: 03/16/2017
• Status: Active Grant

• Current Assignee: Chongqing HKC Optoelectronics Technology Co., Ltd. (Shenzhen Huike Investment Holding Co., Ltd.), HKC Corporation Limited (Shenzhen Huike Investment Holding Co., Ltd.)
• Original Assignee: HKC Corporation Limited (Shenzhen Huike Investment Holding Co., Ltd.)
• Inventors: Chien, Chung-Kuang
• Primary Examiner(s): Vu, David
• Assistant Examiner(s): Fox, Brandon C
• Application Number:
  US15/744,792
• Publication Number:
  US 20190011741A1
• Time in Patent Office: 1,173 Days
• Field of Search: 349 47, 257 72
• CPC Class Codes: G02F 1/133345 Insulating layers G02F1/1335, G02F1/1337, G02F1/135, G02F1/136 take precedence
• CPC Class Codes: G02F 1/133514 Colour filters
• CPC Class Codes: G02F 1/136222 Colour filters incorporated in the active matrix substrate
• CPC Class Codes: G02F 1/1368 in which the switching element is a three-electrode device G02F1/136277 takes precedence
• CPC Class Codes: H01L 27/1248 with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
• CPC Class Codes: H01L 27/1288 employing particular masking sequences or specially adapted masks, e.g. half-tone mask

Abstract

The present disclosure provides a display panel, including a substrate and an active switches disposed on the substrate. A composite photoresist layer having dielectric properties is covered on the active switches, to reduce manufacturing procedures of the display panel.

Claims

1. A display panel, comprising:

a substrate; and

active switches disposed on the substrate;

a composite photoresist layer having dielectric properties covering on the active switches; and

wherein the composite photoresist layer is made of composite photoresist; and

the composite photoresist comprises at least one passivation layer and at least one color layer formed on a high polymer material.

2. The display panel according to claim 1, wherein the active switches comprise gate electrodes disposed on the substrate, a semiconductor layer disposed on the gate electrodes, and source electrodes and drain electrodes disposed on the semiconductor layer;

the composite photoresist layer covers on the source electrodes and the drain electrodes.

3. The display panel according to claim 2, wherein the composite photoresist layer has an opening corresponding to the source electrodes and the drain electrodes.

4. The display panel according to claim 1, wherein the passivation layer and the color layer both have one layer, and the passivation layer and the color layer are stacked.

5. The display panel according to claim 4, wherein the active switches comprise gate electrodes disposed on the substrate, a semiconductor layer disposed on the gate electrodes, and source electrodes and drain electrodes disposed on the semiconductor layer;

the composite photoresist layer covers on the source electrodes and the drain electrodes.

6. The display panel according to claim 5, wherein the composite photoresist layer has an opening corresponding to the source electrodes and the drain electrodes.

7. The display panel according to claim 1, wherein the passivation layer has two layers and the color layer has one layer, and the color layer is positioned between two passivation layers.

8. The display panel according to claim 7, wherein the active switches comprise gate electrodes disposed on the substrate, a semiconductor layer disposed on the gate electrodes, and source electrodes and drain electrodes disposed on the semiconductor layer;

the composite photoresist layer covers on the source electrodes and the drain electrodes.

9. The display panel apparatus according to claim 8, wherein the composite photoresist layer has an opening corresponding to the source electrodes and the drain electrodes.

10. A method for manufacturing a display panel comprising a substrate and active switches disposed on the substrate, wherein the method comprises:

covering composite photoresist on the active switches; and

obtaining a composite photoresist layer covering on the active switches using a mask process;

wherein the composite photoresist layer is made of composite photoresist; and

the composite photoresist comprises at least one passivation layer and at least one color layer formed on a high polymer material.

11. The method for manufacturing the display panel according to claim 10, wherein the composite photoresist comprises a passivation layer and a color layer, the step for obtaining the composite photoresist comprises:

adding passivation material to a lower layer of high polymer material;

adding color material to an upper layer of the high polymer material; and

obtaining the composite photoresist having double-layer structure using a photo-curing process and a thermal reaction process.

12. The method for manufacturing the display panel according to claim 10, wherein the passivation layer has two layers and the color layer has one layer, the step for obtaining the composite photoresist comprises:

adding passivation material to a lower layer of high polymer material;

adding color material to a middle layer of the high polymer material;

adding the passivation material to an upper layer of the high polymer material; and

obtaining the composite photoresist having three-layers structure using a photo-curing process and a thermal reaction process.

13. The method for manufacturing the display panel according to claim 10, wherein the step for obtaining the composite photoresist comprises:

adding mixture of passivation material and color material to high polymer material; and

obtaining the composite photoresist having one-layer structure using a photo-curing process and a thermal reaction process.

14. The method for manufacturing the display panel according to claim 10, wherein the step for obtaining the composite photoresist covered on the active switches using a mask process comprises:

arranging photosensitive material on the composite photoresist layer;

obtaining pattern of the composite photoresist layer using a mask process;

obtaining the composite photoresist layer using etching with an etching solution; and

removing a remaining photosensitive material.