Method for performing a photolithography process
First Claim
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1. A method for performing a photolithography process, comprising:
- forming a layer over a substrate;
exposing a portion of the layer to form an exposed region;
performing a baking process on the layer, so that voids are formed in the exposed region of the layer, wherein the layer comprises a polymer and an acid labile group (ALG), and the ALG cleaves from the polymer when performing the baking process on the layer; and
filling the void with a post treatment coating material, wherein the post treatment coating material is over the exposed region of the layer.
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Abstract
A method for performing a photolithography process is provided. The method includes forming a layer over a substrate, and exposing a portion of the layer to form an exposed region. The method also includes performing a baking process on the layer, so that voids are formed in the exposed region of the layer. The method further includes filling the void with a post treatment coating material, and the post treatment coating material is over the exposed region of the layer.
32 Citations
20 Claims
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1. A method for performing a photolithography process, comprising:
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forming a layer over a substrate; exposing a portion of the layer to form an exposed region; performing a baking process on the layer, so that voids are formed in the exposed region of the layer, wherein the layer comprises a polymer and an acid labile group (ALG), and the ALG cleaves from the polymer when performing the baking process on the layer; and filling the void with a post treatment coating material, wherein the post treatment coating material is over the exposed region of the layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 20)
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9. A method for performing a photolithography process, comprising:
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forming a resist layer over a substrate; exposing a portion of the resist layer to form a first exposed region, a second exposed region and an unexposed region between the first exposed region and the second exposed region; performing a baking process on the resist layer, so that voids are formed in the first exposed region and the second exposed region; forming a first coating material over the first exposed region, the second exposed region, and in the voids; and forming a second coating material on a sidewall of the first exposed region and a sidewall of the second exposed region. - View Dependent Claims (10, 11, 12, 13, 14)
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15. A method for performing a photolithography process, comprising:
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forming a resist layer over a substrate, wherein the resist layer comprises a polymer and an acid labile group (ALG) linked to the polymer; exposing a portion of the resist layer to form an exposed region and an unexposed region; performing a heating process on the resist layer, so that the acid labile group cleaves from the polymer to form voids in the exposed region; and forming a first coating material over the exposed region, an unexposed region and in the voids. - View Dependent Claims (16, 17, 18, 19)
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Specification