Thin-film devices and fabrication

• US 10,802,371 B2
• Filed: 12/24/2015
• Issued: 10/13/2020
• Est. Priority Date: 12/12/2011
• Status: Active Grant

• Current Assignee: View Incorporated
• Original Assignee: View Incorporated
• Inventors: Dixit, Abhishek Anant, Martin, Todd William, Pradhan, Anshu A., Strong, Fabian, Rozbicki, Robert T.
• Primary Examiner(s): Jones, James C.
• Application Number:
  US15/539,650
• Publication Number:
  US 20180259822A1
• Time in Patent Office: 1,755 Days
• Field of Search: 359275
• CPC Class Codes: B23K 2101/40 Semiconductor devices
• CPC Class Codes: B23K 2103/172 wherein at least one of the layers is non-metallic
• CPC Class Codes: B23K 2103/18 Dissimilar materials
• CPC Class Codes: B23K 2103/54 Glass
• CPC Class Codes: B23K 26/0624 using ultrashort pulses, i.e. pulses of 1ns or less
• CPC Class Codes: B23K 26/082 Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
• CPC Class Codes: B23K 26/0846 for moving elongated workpieces longitudinally, e.g. wire or strip material
• CPC Class Codes: B23K 26/361 for deburring or mechanical trimming B23K26/351 takes precedence
• CPC Class Codes: B23K 26/38 by boring or cutting
• CPC Class Codes: B23K 26/402 involving non-metallic material, e.g. isolators
• CPC Class Codes: B23K 26/57 the laser beam entering a face of the workpiece from which it is transmitted through the workpiece material to work on a different workpiece face, e.g. for effecting removal, fusion splicing, modifying or reforming
• CPC Class Codes: B32B 17/06 comprising glass as the main or only constituent of a layer, next to another layer of a specific material
• CPC Class Codes: C03B 33/076 Laminated glass comprising interlayers
• CPC Class Codes: C03C 17/3411 with at least two coatings of inorganic materials C03C17/36, C03C17/42 take precedence
• CPC Class Codes: C03C 2217/94 Transparent conductive oxide layers [TCO] being part of a multilayer coating
• CPC Class Codes: C03C 2217/948 Layers comprising indium tin oxide [ITO]
• CPC Class Codes: E06B 2009/2464 featuring transparency control by applying voltage, e.g. LCD, electrochromic panels
• CPC Class Codes: E06B 9/24 Screens or other constructions affording protection against light, especially against sunshine; Similar screens for privacy or appearance; Slat blindsoperating, guiding or securing devices or arrangements for roll-type closures E06B9/56; free-hanging flexible screens A47H23/00
• CPC Class Codes: G02F 1/1523 comprising inorganic material
• CPC Class Codes: G02F 1/1524 Transition metal compounds
• CPC Class Codes: G02F 1/153 : Constructional details
• CPC Class Codes: G02F 1/1533 : structural features not otherwise provided for
• CPC Class Codes: G02F 1/155 : Electrodes
• CPC Class Codes: H01B 5/14 : comprising conductive layers or films on insulating-supports
• CPC Class Codes: H01L 27/1443 : with at least one potential jump or surface barrier

Abstract

Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

Claims

1. A bus bar pad expose method comprising, in the following order:

providing an optical device comprising a lower transparent conductor layer and an electrochromic device stack disposed over a substantially transparent substrate;

removing one or more material layers over the lower transparent conductor layer across a bus bar expose area along a side of the substantially transparent substrate;

removing material from the lower transparent conductor layer at spaced punch through areas within the bus bar expose area; and

filling the spaced punch through areas with a material to form a bus bar.

2. The bus bar pad expose method of claim 1, wherein the electrochromic device stack comprises multiple material layers and an upper transparent conductor layer.

3. The bus bar pad expose method of claim 1, wherein the one or more material layers are removed down to the lower transparent conductor layer.

4. The bus bar pad expose method of claim 1, wherein the one or more material layers are removed down to a defect mitigation insulating layer (DMIL) on top of the lower transparent conductor layer.

5. The bus bar pad expose method of claim 1, wherein the bus bar material is a conductive ink or a solder material.

6. The bus bar pad expose method of claim 1, wherein the one or more material layers removed over the lower transparent conductor layer are removed using a mechanical grinder.

7. The bus bar pad expose method of claim 6, wherein the mechanical grinder translates across the bus bar expose area in multiple passes.

8. The bus bar pad expose method of claim 6, wherein the mechanical grinder translates across the bus bar expose area in a single pass.

9. The bus bar pad expose method of claim 6, wherein the mechanical grinder is a grinding wheel.

10. The bus bar pad expose method of claim 1, wherein the one or more material layers removed over the lower transparent conductor layer are removed using laser ablation.

11. The bus bar pad expose method of claim 10, wherein the one or more material layers removed over the lower transparent conductor layer are removed using laser radiation applied from a substrate side.

12. The bus bar pad expose method of claim 10, wherein the one or more material layers removed over the lower transparent conductor layer are removed using laser radiation applied from a film side.

13. The bus bar pad expose method of claim 1, wherein the material is removed from the lower transparent conductor layer at spaced punch through areas by laser ablation applying laser radiation from a substrate side.

14. The bus bar pad expose method of claim 1, wherein the material is removed from the lower transparent conductor layer at spaced punch through areas by laser ablation applying laser radiation from a film side.

15. The bus bar pad expose method of claim 1, wherein the material is removed from the lower transparent conductor layer by laser radiation and laser ablation of the spaced punch through areas occurs substantially simultaneously.

16. The bus bar pad expose method of claim 1,

wherein the spaced punch through areas form a plurality of separated scribe lines along the side of the substantially transparent substrate;

and

wherein the optical device is at least partially intact between the separated scribe lines.

17. The bus bar pad expose method of claim 1, wherein the one or more material layers removed over the lower transparent conductor layer have low optical selectivity with respect to the lower transparent conductor layer, and are removed using a mechanical grinder.

18. An optically switchable device comprising:

a substantially transparent substrate;

an optical device comprising a lower transparent conductor layer and an electrochromic device stack disposed over the substantially transparent substrate;

a bus bar expose area along a side of the substantially transparent substrate, the bus bar expose area comprising a region with material removed from the electrochromic device stack and spaced punch through areas penetrating the lower transparent conductor layer within the region; and

a bus bar contacting the lower transparent conductor layer through the spaced punch through areas along the side of the substantially transparent substrate.

19. The optically switchable device of claim 18, wherein the electrochromic device stack comprises multiple material layers and an upper transparent conductor layer.

20. The optically switchable device of claim 18, wherein the bus bar comprises a conductive ink or a solder material.

21. The optically switchable device of claim 18, wherein the material is removed from the lower transparent conductor layer at the spaced punch through areas by applying laser radiation from a substrate side of from a film side.

22. The optically switchable device of claim 18,

wherein the spaced punch through areas form a plurality of separated scribe lines along the side of the substantially transparent substrate;

and

wherein the optical device is at least partially intact between the separated scribe lines.

23. A bus bar pad expose method the comprising, in the following order:

providing an optical device comprising a lower transparent conductor layer and an electrochromic device stack disposed over a substantially transparent substrate;

multi-fluence level laser ablating to remove one or more material layers from the optical device at spaced punch through areas penetrating into the lower transparent conductor layer, wherein the spaced punch through areas are in a bus bar expose area along a side of the substantially transparent substrate; and

filling the spaced punch through areas with a material to form a bus bar.

24. The bus bar pad expose method of claim 23, wherein the electrochromic device stack comprises multiple material layers and an upper transparent conductor layer.

25. The bus bar pad expose method of claim 23, wherein the bus bar material is a conductive ink or a solder material.

26. The bus bar pad expose method of claim 23, wherein the one or more material layers are removed using a mechanical grinder.

27. The bus bar pad expose method of claim 23, wherein the one or more material layers are removed using laser ablation from a substrate side or from a film side.

28. The bus bar pad expose method of claim 23,

wherein the spaced punch through areas form a plurality of separated scribe lines running along the side of the substantially transparent substrate;

and

wherein the optical device remains at least partially intact between the separated scribe lines.