Manufacturing method of semiconductor device

• US 10,833,202 B2
• Filed: 11/30/2017
• Issued: 11/10/2020
• Est. Priority Date: 06/10/2011
• Status: Active Grant

• Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Original Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Inventors: Koezuka, Junichi, Ohno, Shinji, Sato, Yuichi, Yamazaki, Shunpei
• Primary Examiner(s): Lee, Jae
• Application Number:
  US15/827,426
• Publication Number:
  US 20180145180A1
• Time in Patent Office: 1,076 Days
• CPC Class Codes: H01L 29/24 including, apart from doping materials or other impurities, only semiconductor materials not provided for in groups H01L29/16, H01L29/18, H01L29/20, H01L29/22 including organic materials H10K99/00
• CPC Class Codes: H01L 29/4908 for thin film semiconductor, e.g. gate of TFT
• CPC Class Codes: H01L 29/495 the conductor material next to the insulator being a simple metal, e.g. W, Mo H01L29/4908, H01L29/4983 take precedence
• CPC Class Codes: H01L 29/66969 of devices having semiconductor bodies not comprising group 14 or group 13/15 materials comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials, comprising cuprous oxide or cuprous iodide H01L21/02365
• CPC Class Codes: H01L 29/78603 characterised by the insulating substrate or support H01L29/78657 takes precedence
• CPC Class Codes: H01L 29/78618 characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure silicide contacts, electrodes in general H01L29/458
• CPC Class Codes: H01L 29/7869 having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate

Abstract

A transistor using an oxide semiconductor, which has good on-state characteristics is provided. A high-performance semiconductor device including the transistor capable of high-speed response and high-speed operation is provided. The transistor includes the oxide semiconductor film including a channel formation region and low-resistance regions in which a metal element and a dopant are included. The channel formation region is positioned between the low-resistance regions in the channel length direction. In a manufacturing method of the transistor, the metal element is added by heat treatment performed in the state where the oxide semiconductor film is in contact with a film including the metal element and the dopant is added through the film including the metal element by an implantation method so that the low resistance regions in which a metal element and a dopant are included are formed.

Claims

1. A semiconductor device comprising:

an oxide semiconductor layer comprising a first region, a second region, a third region, and a fourth region;

a gate electrode layer over the oxide semiconductor layer;

a first electrode electrically connected to the second region; and

a nitride layer over the oxide semiconductor layer, the gate electrode layer, and the first electrode,

wherein the nitride layer contains a metal element,

wherein the gate electrode layer overlaps the first region,

wherein the second region and the third region are in contact with the nitride layer,

wherein the first electrode overlaps and is in contact with the fourth region,

wherein a concentration of the metal element of the second region and a concentration of the metal element of the third region are each higher than a concentration of the metal element of the first region and a concertation of the metal element in the fourth region, and

wherein a resistance of the second region and a resistance of the third region are each lower than a resistance of the first region and a resistance of the fourth region.

2. The semiconductor device according to claim 1, further comprising:

a second electrode electrically connected to the third region,

wherein the second electrode overlaps and is in contact with a fifth region of the oxide semiconductor layer, and

wherein the concentration of the metal element of the second region and the concentration of the metal element of the third region are each higher than a concentration of the metal element of the fifth region.

3. The semiconductor device according to claim 2, further comprising:

a third electrode; and

a fourth electrode,

wherein the nitride layer is over the second electrode, and

wherein the third electrode is electrically connected to the first electrode through a first opening in the nitride layer and the fourth electrode is electrically connected to the second electrode through a second opening in the nitride layer.

4. The semiconductor device according to claim 1, wherein the metal element is one or more selected from aluminum, titanium, molybdenum, tungsten, hafnium, tantalum, lanthanum, barium, magnesium, zirconium, and nickel.

5. The semiconductor device according to claim 1, wherein the oxide semiconductor layer comprises indium.

6. The semiconductor device according to claim 1, wherein the oxide semiconductor layer comprises indium, gallium and zinc.