Substrate support with real time force and film stress control
First Claim
Patent Images
1. A substrate support, comprising:
- a puck, the puck comprising;
a workpiece support surface; and
a gas hole formed through the workpiece support surface; and
a sensor assembly mounted in the gas hole below the workpiece support surface and configured to detect a metric of distance to a workpiece disposed on the workpiece support surface, wherein the sensor assembly has passages that permit fluid to pass through the sensor assembly when positioned in the gas hole, and wherein the sensor assembly has a sensor housing and a sensor, the sensor housing has a split plate configured to be disposed around at least a portion of the sensor, and wherein the passages include gas passages formed in the split plate.
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Abstract
Embodiments disclosed herein include a substrate support having a sensor assembly, and processing chamber having the same. In one embodiment, a substrate support has a puck. The puck has a workpiece support surface and a gas hole exiting the workpiece support surface. A sensor assembly is disposed in the gas hole and configured to detect a metric indicative of a deflection of a workpiece disposed on the workpiece support surface, wherein the sensor assembly is configured to allow gas to flow past the sensor assembly when positioned in the gas hole.
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Citations
16 Claims
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1. A substrate support, comprising:
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a puck, the puck comprising; a workpiece support surface; and a gas hole formed through the workpiece support surface; and a sensor assembly mounted in the gas hole below the workpiece support surface and configured to detect a metric of distance to a workpiece disposed on the workpiece support surface, wherein the sensor assembly has passages that permit fluid to pass through the sensor assembly when positioned in the gas hole, and wherein the sensor assembly has a sensor housing and a sensor, the sensor housing has a split plate configured to be disposed around at least a portion of the sensor, and wherein the passages include gas passages formed in the split plate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A processing chamber, comprising:
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a chamber body enclosing a chamber interior volume; and a substrate support disposed in the chamber interior volume, the substrate support comprising; a puck, the puck comprising; a workpiece support surface; and a gas hole formed through the workpiece support surface; and a sensor assembly mounted in the gas hole below the workpiece support surface and configured to detect a metric of distance to a workpiece disposed on the workpiece support surface, wherein the sensor assembly has passages that permit fluid to pass through the sensor assembly when positioned in the gas hole, and wherein the sensor assembly has a sensor housing and a sensor, the sensor housing has a split plate configured to be disposed around at least a portion of the sensor, and wherein the passages include gas passages formed in the split plate. - View Dependent Claims (14, 15, 16)
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Specification