Method for preparing invisible anodic aluminum oxide pattern
First Claim
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1. A method for preparing invisible anodic aluminum oxide patterns comprising:
- providing an aluminum substrate;
performing a first anodizing of the aluminum substrate to form a first anodic aluminum oxide (AAO) on a surface of the aluminum substrate, said first AAO having a first anodized surface;
defining a pattern on the first AAO by performing photolithography, said pattern having a first portion of the first AAO covered with a photoresist and a second portion of the first AAO free of the photoresist;
performing a second anodizing of the second portion of the first AAO free of the photoresist on the aluminum substrate to form a second AAO on the first AAO, said second AAO having a second anodized surface;
removing the photoresist from and exposing said first portion of the first AAO, thus establishing a first operational mode having said second anodized surface of the second AAO forming an invisible pattern with said first portion of the first AAO exposed upon removal of the photoresist; and
transferring said first operational mode into a second operational mode wherein the invisible pattern is rendered visible by at least one operational process selected from a group consisting of;
(a) annealing said invisible pattern, and subsequently exposing the annealed invisible pattern, to ultraviolet (UV) light;
or(b) treating said invisible pattern by pore-widening, and subsequently performing droplet addition on the pore-widened invisible pattern.
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Abstract
A method for preparing invisible anodic aluminum oxide (AAO) patterns is revealed. The method includes a plurality of steps. First take an aluminum substrate. Then anodize the aluminum substrate for the first time to get a first anodic aluminum oxide (AAO). Next perform photolithography so that a photoresist forms a pattern on the aluminum substrate with the first AAO. Lastly anodize the aluminum substrate for the second time so that a second AAO is formed on the pattern and the pattern becomes invisible.
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11 Claims
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1. A method for preparing invisible anodic aluminum oxide patterns comprising:
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providing an aluminum substrate; performing a first anodizing of the aluminum substrate to form a first anodic aluminum oxide (AAO) on a surface of the aluminum substrate, said first AAO having a first anodized surface; defining a pattern on the first AAO by performing photolithography, said pattern having a first portion of the first AAO covered with a photoresist and a second portion of the first AAO free of the photoresist; performing a second anodizing of the second portion of the first AAO free of the photoresist on the aluminum substrate to form a second AAO on the first AAO, said second AAO having a second anodized surface; removing the photoresist from and exposing said first portion of the first AAO, thus establishing a first operational mode having said second anodized surface of the second AAO forming an invisible pattern with said first portion of the first AAO exposed upon removal of the photoresist; and transferring said first operational mode into a second operational mode wherein the invisible pattern is rendered visible by at least one operational process selected from a group consisting of; (a) annealing said invisible pattern, and subsequently exposing the annealed invisible pattern, to ultraviolet (UV) light;
or(b) treating said invisible pattern by pore-widening, and subsequently performing droplet addition on the pore-widened invisible pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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Specification