Light emitting device, method of manufacturing the same, and thin film forming apparatus
First Claim
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1. A thin film forming apparatus comprising:
- a first film forming chamber for forming a first conductive film by vacuum evaporation using a first mask into a first pattern;
a second film forming chamber for forming a second conductive film by vacuum evaporation using a second mask into a second pattern;
a third film forming chamber for forming an organic film by vacuum evaporation using a third mask into a third pattern;
a fourth film forming chamber for forming a light transmissive conductive film, wherein each of the first through fourth film forming chambers is connected to a transferring chamber, wherein the transferring chamber has transferring means for transferring a substrate.
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Abstract
A method of manufacturing a light emitting device of upward emission type and a thin film forming apparatus used in the method are provided. A plurality of film forming chambers are connected to a first transferring chamber. The plural film forming chambers include a metal material evaporation chamber, an EL layer forming chamber, a sputtering chamber, a CVD chamber, and a sealing chamber. By using this thin film forming apparatus, an upward emission type EL element can be fabricated without exposing the element to the outside air. As a result, a highly reliable light emitting device is obtained.
157 Citations
27 Claims
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1. A thin film forming apparatus comprising:
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a first film forming chamber for forming a first conductive film by vacuum evaporation using a first mask into a first pattern;
a second film forming chamber for forming a second conductive film by vacuum evaporation using a second mask into a second pattern;
a third film forming chamber for forming an organic film by vacuum evaporation using a third mask into a third pattern;
a fourth film forming chamber for forming a light transmissive conductive film, wherein each of the first through fourth film forming chambers is connected to a transferring chamber, wherein the transferring chamber has transferring means for transferring a substrate. - View Dependent Claims (3, 4, 5, 19)
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2. A thin film forming apparatus comprising:
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a first film forming chamber for forming a first conductive film by vacuum evaporation using a first mask into a first pattern;
a second film forming chamber for forming a second conductive film by vacuum evaporation using a second mask into a second pattern;
a third film forming chamber for forming an organic film by vacuum evaporation using a third mask into a third pattern;
a fourth film forming chamber for forming a light transmissive conductive film by sputtering, wherein each of the first through fourth film forming chambers is separated by a gate, wherein the first through fourth film forming chambers are connected in series. - View Dependent Claims (20, 21, 22, 23)
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6. A method of manufacturing a light emitting device, said method comprising the steps of:
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forming a first conductive film by vacuum evaporation;
forming a second conductive film on the first conductive film by vacuum evaporation;
forming an organic film on the second conductive film by vacuum evaporation;
forming a passivation film on the organic film by vacuum evaporation; and
forming a light transmissive conductive film on the passivation film by sputtering, wherein each of the first conductive film, the second conductive film, and the organic film is formed into a pattern using a mask. - View Dependent Claims (8, 9, 10, 24)
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7. A method of manufacturing a light emitting device, said method comprising the steps of:
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forming a first conductive film by vacuum evaporation;
forming a second conductive film on the first conductive film by vacuum evaporation;
forming an organic film on the second conductive film by vacuum evaporation;
forming a passivation film on the organic film by vacuum evaporation;
forming a light transmissive conductive film on the passivation film by sputtering, wherein the first conductive film, the second conductive film, the organic film, the passivation film and the light transmissive conductive film are successively formed under a reduced pressure. - View Dependent Claims (25, 26, 27)
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11. A light emitting device comprising:
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at least a thin film transistor over a substrate;
a first conductive film formed over the thin film transistor;
a second conductive film in contact with the first conductive film;
an organic film in contact with the second conductive film;
a passivation film in contact with the organic film;
a light transmissive conductive film in contact with the passivation film. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18)
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Specification
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Current AssigneeSemiconductor Energy Laboratory Co., Ltd.
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Original AssigneeSemiconductor Energy Laboratory Co., Ltd.
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InventorsKonuma, Toshimitsu, Yamazaki, Hiroko
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Granted Patent
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Time in Patent OfficeDays
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Field of Search
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US Class Current313/504
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CPC Class CodesH10K 2102/3026 Top emissionH10K 59/12 Active-matrix OLED [AMOLED]...H10K 71/00 Manufacture or treatment sp...
