Alignment mark system for mass transport processes
First Claim
Patent Images
1. A mass transported alignment mark system, comprising:
- a substrate that has been subjected to a mass transport process; and
a lens alignment structure formed on the substrate that yields a light pattern when the substrate or a plane near the substrate is imaged.
1 Assignment
0 Petitions
Accused Products
Abstract
A technique for creating alignment feature in mass transported substrates yields alignment features that can be located with high degrees of accuracy. Specifically, structures such as concave or convex lenses are created that yield a light pattern in transmission or reflection when the part of the substrate is imaged or a plane near the substrate is imaged. This light pattern is then used to align the substrate during subsequent lithography or packaging processes.
3 Citations
26 Claims
-
1. A mass transported alignment mark system, comprising:
-
a substrate that has been subjected to a mass transport process; and
a lens alignment structure formed on the substrate that yields a light pattern when the substrate or a plane near the substrate is imaged. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
-
-
14. An alignment mark system, comprising:
-
a substrate; and
a lens alignment structure formed in the substrate that has a focal point in the substrate or near a surface of the substrate.
-
Specification