Toroidal low-field reactive gas source
First Claim
Patent Images
1. An apparatus for dissociating gases comprising:
- a) a plasma chamber;
b) a transformer having a magnetic core surrounding a portion of the plasma chamber and a primary winding;
c) one or more switching semiconductor devices directly coupled to a voltage supply and having an output coupled to the primary winding, the one or more switching semiconductor devices driving current in the primary winding, the current inducing a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.
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Abstract
An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.
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Citations
43 Claims
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1. An apparatus for dissociating gases comprising:
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a) a plasma chamber;
b) a transformer having a magnetic core surrounding a portion of the plasma chamber and a primary winding;
c) one or more switching semiconductor devices directly coupled to a voltage supply and having an output coupled to the primary winding, the one or more switching semiconductor devices driving current in the primary winding, the current inducing a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 15, 16, 17, 18, 20, 21, 22, 23, 24, 25, 26, 27, 28, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41)
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14. An apparatus for generating ions comprising:
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a) a plasma chamber;
b) a transformer having a magnetic core surrounding a portion of the plasma chamber and a primary winding;
c) one or more switching semiconductor devices directly coupled to a voltage supply and having an output coupled to the primary winding, the one or more switching semiconductor devices driving current in the primary winding, the current inducing a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer. d) an orifice positioned in the chamber for directing ions generated by the plasma.
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19. An apparatus for dissociating gases comprising:
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a) a plasma chamber comprising an electrically conductive material and at least one dielectric region that prevents induced current flow in the chamber;
b) a transformer having a magnetic core surrounding a portion of the plasma chamber and a primary winding;
c) a power supply having an output electrically connected to the primary winding, the power supply driving current in the primary winding, the current inducing a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.
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29. A method for dissociating gases comprising:
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a) providing a chamber for containing a gas at a pressure;
b) providing a transformer having a magnetic core surrounding a portion of the chamber and a primary winding;
c) directly coupling one or more switching semiconductor devices to a voltage supply and generating a current driving the primary winding with the one or more switching semiconductor devices; and
d) inducing a potential inside the chamber with the current in the primary winding, the potential forming a plasma which completes a secondary circuit of the transformer.
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42. A method for cleaning a process chamber comprising:
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a) providing a plasma chamber for containing a reactive gas at a pressure, the plasma chamber being coupled to the process chamber;
b) providing a transformer having a magnetic core surrounding a portion of the plasma chamber and a primary winding;
c) directly coupling one or more switching semiconductor devices to a voltage supply and generating a current driving the primary winding with the one or more switching semiconductor devices;
d) inducing a potential inside the chamber with the current in the primary winding, the potential forming a plasma which completes a secondary circuit of the transformer; and
e) directing chemically active species generated in the plasma from the plasma chamber into the process chamber thereby cleaning the process chamber.
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43. A method for generating reactive gases comprising:
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a) providing a plasma chamber for containing a reactive gas at a pressure;
b) providing a transformer having a magnetic core surrounding a portion of the plasma chamber and a primary winding;
c) directly coupling one or more switching semiconductor devices to a voltage supply and generating a current driving the primary winding with the one or more switching semiconductor devices;
d) inducing a potential inside the chamber with the current in the primary winding, the potential forming a plasma which completes a secondary circuit of the transformer; and
e) generating reactive gas in the plasma.
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Specification