Anti-reflection coating with transparent surface conductive layer

• US 20020182393A1
• Filed: 04/18/2001
• Published: 12/05/2002
• Est. Priority Date: 04/18/2001
• Status: Active Grant

• Current Assignee: Applied Vacuum Coating Technologies Co., Ltd.
• Original Assignee: Applied Vacuum Coating Technologies Co., Ltd.
• Inventors: Chu, Jau-Jier
• Granted Patent: US 6,586,101 B2
• Time in Patent Office: Days
• US Class Current: 428/216
• CPC Class Codes: G02B 1/116 including electrically conducting layers
• CPC Class Codes: Y10T 428/24975 No layer or component greater than 5 mils thick
• CPC Class Codes: Y10T 428/265 1 mil or less

Abstract

An anti-reflection coating layer system is composed of 4 oxide layer and more specifically the material of surface layer is a transparent conductive coating and has a high refractive index between 1.9 to 2.1. The materials of surface layer are a kind of transparent conductive coating such as SnO₂, ZnO₂, In₂O₃ and ITO. Because of the surface layer has a good electrical conductive property, the layer system reduce much of work of grounding process and also increase the total yield in the volume production.

Claims

1. An anti-reflection conducting coating comprising five layers designated the first, second, third, fourth and fifth layers in consecutive numerical order beginning with the layer farthest from the substrate;

said first layer being arranged on the second layer and comprising a high refracting material of oxide, the layer having a physical thickness of 10˜

40 nm;

said second layer being arranged on the third layer and comprising a low refracting material of oxide, the layer having a physical thickness of 30˜

60 nm;

said third layer being arranged on the fourth layer and comprising a high refracting material of oxide, the layer having a physical thickness of 30˜

80 nm; and

said fourth layer being arranged on the front surface on the substrate and comprising a high refracting material of oxide, the fifth layer having a physical thickness of 40˜

80 nm.

2. The anti-reflection conductive coating of claim 1, where said substrate is plastic.

3. The anti-reflection conductive coating of claim 1, where said substrate is glass.

4. The anti-reflection conductive coating of claim 1, wherein the first layer is ITO, said second layers are of SiO₂, third layers is NbO and fourth layer is NbSiO.

5. The anti-reflection conductive coating of claim 1, wherein the first layer comprises oxides selected from a group consisting of ITO, SnO₂, ZnO, In₂O₃, SnO₂:

F, SnO₂;

Sb, ZnO ;

Al, In₂O₃ ;

ZnO, SnO2;

ZnO and In₂O₃ MgO.

6. The anti-reflection conductive coating of claim 1, wherein the second layer comprises oxide selected from a group consisting of SiO2 and SiAlO₂.

7. The anti-reflection conductive coating of claim 1, wherein the third layer comprises oxide selected from a group consisting of ITO, Ta₂O₅, NbO and TiO and a mixtures of these oxides.

8. The anti-reflection conductive coating of claim 1, wherein the fourth layer comprises oxide selected from a group consisting of TaSiO, NbSiO, TiSiO, InSiO, SnSiO and a mixtures of these oxides.

9. The anti-reflection conductive coating of claim 1, wherein the first layer is composed of a oxide material with a refractive index between 1.9 and 2.1;

the second layer is composed of a oxide material with a refractive index between 1.46 and 1.5;

the third layer is composed of a oxide material with a refractive index between 2.1 and 2.3;

the fourth layer is composed of a oxide material with a refractive index between 1.90 and 2.1.

10. The anti-reflection conductive coating of claim 1, wherein the those layers are formed by evaporation or sputtering process manufacturing in a batch or in-line vacuum system.

11. The anti-reflection conductive coating of claim 1, wherein the layer structure can be used a basic coating industry of touch sensor.