Visible-light-responsive photoactive coating, coated article, and method of making same

• US 20030027000A1
• Filed: 07/11/2002
• Published: 02/06/2003
• Est. Priority Date: 03/14/1997
• Status: Active Grant

• Current Assignee: PPG Industries Ohio Incorporated (Nouryon BV)
• Original Assignee: PPG Industries Ohio Incorporated (Nouryon BV)
• Inventors: Szanyi, Janos, Greenberg, Charles B.
• Granted Patent: US 7,096,692 B2
• Time in Patent Office: Days
• US Class Current: 428/432
• CPC Class Codes: C03C 17/245 by deposition from the vapour phase
• CPC Class Codes: C03C 17/2456 Coating containing TiO2
• CPC Class Codes: C03C 17/25 by deposition from the liquid phase
• CPC Class Codes: C03C 17/256 Coating containing TiO2
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 17/3435 comprising a nitride, oxynitride, boronitride or carbonitride
• CPC Class Codes: C03C 17/3441 comprising carbon, a carbide or oxycarbide
• CPC Class Codes: C03C 2217/212 TiO2
• CPC Class Codes: C03C 2217/24 Doped oxides
• CPC Class Codes: C03C 2217/71 Photocatalytic coatings
• CPC Class Codes: C03C 2218/112 by spraying
• CPC Class Codes: C03C 2218/152 by cvd
• CPC Class Codes: C03C 2218/154 by sputtering
• CPC Class Codes: C03C 2218/155 by reactive sputtering
• CPC Class Codes: C03C 2218/156 by magnetron sputtering
• CPC Class Codes: C03C 2218/32 After-treatment
• CPC Class Codes: C03C 2218/365 Coating different sides of a glass substrate
• CPC Class Codes: C23C 16/40 Oxides
• CPC Class Codes: Y02T 50/60 Efficient propulsion technologies, e.g. for aircraft
• CPC Class Codes: Y10T 428/265 1 mil or less
• CPC Class Codes: Y10T 428/315 : Surface modified glass [e.g., tempered, strengthened, etc.]
• CPC Class Codes: Y10T 428/31678 : Of metal

Abstract

A method is provided for forming a photoactive coating having a photoabsorption band in the visible region of the electromagnetic spectrum. The method includes depositing a precursor composition over at least a portion of a float glass ribbon in a molten metal bath by a CVD coating device. The precursor composition includes a titania precursor material and at least one other precursor material selected from chromium (Cr), vanadium (V), manganese (Mn), copper (Cu), iron (Fe), magnesium (Mg), scandium (Sc), yttrium (Y), niobium (Nb), molybdenum (Mo), ruthenium (Ru), tungsten (W), silver (Ag), lead (Pb), nickel (Ni), rhenium (Re), and mixtures thereof.

Claims

1. A method of forming a coating, comprising the steps of:

depositing a precursor composition over at least a portion of a substrate surface by a CVD coating device, the precursor composition comprising;

(a) a metal oxide precursor material; and

(b) a photoabsorption band modifying precursor material.

2. The method of claim 1, wherein the metal oxide precursor material is a titania precursor material.

3. The method of claim 2, wherein the titania precursor material is selected from the group consisting of titanium tetrachloride, titanium alkoxides, and mixtures thereof.

4. The method of claim 3, wherein the titania precursor material is selected from titanium isopropoxide and titanium tetraethoxide.

5. The method of claim 1, wherein the material (b) includes at least one metal selected from chromium (Cr), vanadium (V), manganese (Mn), copper (Cu), iron (Fe), magnesium (Mg), scandium (Sc), yttrium (Y), niobium (Nb), molybdenum (Mo), ruthenium (Ru), tungsten (W), silver (Ag), lead (Pb), nickel (Ni), rhenium (Re), and mixtures or combinations thereof.

6. The method of claim 1, wherein the material (b) is configured to modify the photoabsorption band of the coating to include at least a portion of the visible electromagnetic spectrum not in the photoabsorption band of the coating without the material (b).

7. The method of claim 1, wherein the material (b) is configured to modify the photoabsorption band of the coating to include at least one wavelength in the range of 400 nm to 800 nm.

8. The method of claim 1, wherein the material (b) is at least partly soluble in the material (a).

9. The method of claim 1, wherein the substrate is a float glass ribbon and the method includes depositing the precursor materials onto the float glass ribbon.

10. The method of claim 1, wherein the substrate is a float glass ribbon in a molten metal bath and the method includes depositing the precursor materials onto the float glass ribbon in the metal bath.

11. The method of claim 9, wherein the float glass ribbon is located between a molten metal bath and an annealing lehr.

12. The method of claim 1, wherein the coating is photocatalytic upon exposure to electromagnetic energy in the range of 400 nm to 800 nm.

13. The method of claim 1, wherein the coating is photoactively hydrophilic upon exposure to electromagnetic energy in the range of 400 nm to 800 nm.

15. The method of claim 12, wherein the titania precursor material is selected from titanium tetrachloride and titanium alkoxides.

16. The method of claim 15, wherein the titania precursor material is selected from titanium isopropoxide and titanium tetraethoxide

14. A method of forming a photoactive coating having a photoabsorption band including at least a part of the visible region of the electromagnetic spectrum, comprising the steps of:

depositing a precursor composition over at least a portion of a float glass ribbon in a molten metal bath by a CVD coating device, the precursor composition comprising;

a titania precursor material; and

at least-one other precursor material having a metal selected from chromium (Cr), vanadium (V), manganese (Mn), copper (Cu), iron (Fe), magnesium (Mg), scandium (Sc), yttrium (Y), niobium (Nb), molybdenum (Mo), ruthenium (Ru), tungsten (W), silver (Ag), lead (Pb), nickel (Ni), rhenium (Re), and mixtures thereof.

17. The method of claim 14, including heating the substrate to a temperature sufficient to decompose the titania precursor material and the other precursor material to form the photoactive coating.

18. The method of claim 14, wherein the photoactive coating is photocatalytic upon exposure to electromagnetic energy in the range of 400 nm to 800 nm.

19. The method of claim 14, wherein the photoactive coating is photoactively hydrophilic upon exposure to electromagnetic energy in the range of 400 nm to 800 nm.

20. The method of claim 14, including depositing sufficient precursor composition such that the photocatalytic coating has a thickness in the range of about 50 Å

to about 2000 Å

.

21. The method of claim 14, including depositing an intermediate layer between the ribbon and the photocatalytic coating.

22. The method of claim 21, wherein the intermediate layer is an antireflective layer.

23. The method of claim 22, wherein the antireflective layer comprises at least one of aluminum oxide, tin oxide, indium oxide, silicon oxide, silicon oxycarbide, and silicon oxynitride.

24. The method of claim 21, wherein the intermediate layer is a sodium ion diffusion barrier layer.

25. The method of claim 24, wherein the barrier layer includes at least one of silicon oxide, silicon nitride, silicon oxynitride, silicon oxycarbide, aluminum oxide, fluorine doped aluminum oxide, aluminum nitride, and mixtures thereof.

26. An article, comprising:

a substrate having at least one surface; and

a coating deposited over at least a portion of the substrate surface,

wherein the coating comprises titania and at least one additional material selected from chromium (Cr), vanadium (V), manganese (Mn), copper (Cu), iron (Fe), magnesium (Mg), scandium (Sc), yttrium (Y), niobium (Nb), molybdenum (Mo), ruthenium (Ru), tungsten (W), silver (Ag), lead (Pb), nickel (Ni), rhenium (Re), and mixtures thereof, and

wherein the coating is deposited over the substrate by chemical vapor deposition.

27. The article of claim 26, wherein the substrate is selected from glass, plastic, and ceramic.

28. The article of claim 26, wherein the article is an insulating glass unit and the substrate is at least one of the panes of the insulating glass unit.

29. The article of claim 26, wherein the substrate is selected from annealed glass, tempered glass, and heat strengthened glass.

30. The article of claim 26, wherein the article is an architectural transparency.

31. The article of claim 26, wherein the coating is deposited directly on the substrate surface.

32. The article of claim 26, wherein the coating comprises titania at least partly in the anatase phase.

33. The article of claim 26, wherein the coating comprises titania at least partly in the rutile phase.

34. The article of claim 26, wherein the substrate includes at least one surface having tin diffused therein.

35. The article of claim 26, wherein the coating has a thickness of about 50 Å

to about 2000 Å

.

36. The article of claim 26, wherein the substrate is a float glass ribbon.

37. The article of claim 26, including at least one intermediate layer located between the substrate surface and the coating.

38. The article of claim 37, wherein the intermediate layer is an antireflective layer.

39. The article of claim 37, wherein the intermediate layer is a sodium ion diffusion barrier layer.

40. The article of claim 38, wherein the antireflective layer comprises at least one of aluminum oxide, tin oxide, indium oxide, silicon oxide, silicon oxycarbide, silicon oxynitride, and mixtures thereof.

41. The article of claim 39, wherein the barrier layer comprises at least one of tin oxide, silicon oxide, titanium oxide, zirconium oxide, fluorine-doped tin oxide, aluminum oxide, magnesium oxide, zinc oxide, cobalt oxide, chromium oxide, iron oxide, and mixtures thereof.

42. A method of forming a coating, comprising the steps of:

depositing a sodium ion diffusion barrier layer over at least a portion of a substrate;

depositing a photoactive coating over at least a portion of the barrier layer; and

implanting at least one selected metal into the photoactive coating by ion-implantation to form a photoactive coating having an absorption band including at least one wavelength in the range of 400 nm to 800 nm.