High speed photoresist stripping chamber

  • US 20030029833A1
  • Filed: 09/03/2002
  • Published: 02/13/2003
  • Est. Priority Date: 03/20/2000
  • Status: Abandoned Application
First Claim
Patent Images

1. In a plasma processing system including a load lock chamber and a processing chamber, the improvement comprising:

  • a pre-heating wafer holder for pre-heating a substrate to be processed next in the processing chamber.

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