Polystyrene as a resist for making patterned media

  • US 20030104316A1
  • Filed: 03/29/2002
  • Published: 06/05/2003
  • Est. Priority Date: 11/30/2001
  • Status: Active Grant
First Claim
Patent Images

1. A method of making patterned medium, comprising the steps of:

  • using a patterned thermoplastic polymer having a pattern, deposited over a magnetic medium, as a mask; and

    exposing said patterned thermoplastic polymer to ions which penetrate the polymer according to said pattern and patterning a magnetic layer.

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