Protective sheath for portable electronic device and method for making same

• US 20030151890A1
• Filed: 10/15/2002
• Published: 08/14/2003
• Est. Priority Date: 02/08/2002
• Status: Abandoned Application

• Current Assignee: Hon Hai Precision Industry Co., Ltd.
• Original Assignee: Hon Hai Precision Industry Co., Ltd.
• Inventors: Huang, John, Huang, Tony, Wang, MeiLin, Ma, JianLi
• Application Number:
  US10/271,087
• Publication Number:
  US 20030151890A1
• Time in Patent Office: Days
• US Class Current: 361/683
• CPC Class Codes: G06F 1/1626 with a single-body enclosure integrating a flat display, e.g. Personal Digital Assistants [PDAs]
• CPC Class Codes: G06F 2200/1633 Protecting arrangement for the entire housing of the computer
• CPC Class Codes: G06F 2200/1634 Integrated protective display lid, e.g. for touch-sensitive display in handheld computer

Abstract

A protective sheath (1) for a personal digital assistant (3) includes a lower cover (13) and an upper cover (11). The upper cover includes a window (111) made of transparent plastic material, and two side wings (112) made of elastomer. The window includes a plastic base (114), and a coating including silicon oxide (113) on a surface of the base. Adherence between the base and the coating is very firm. The window is highly transparent, and has a very smooth and even surface, and has excellent wear-resistance. A method for forming the protective sheath includes the steps of: (1) injection molding the plastic base; (2) pre-treating the base; and (3) putting the base into a vacuum chamber for plasma chemical vapor deposition (PCVD) treatment, whereby the coating including silicon oxide is formed on the surface of the base.

Claims

1. A protective sheath for receiving a portable electronic device therein and protecting the portable electronic device from being scratched, comprising:

an upper cover, comprising a window made of plastic material and two side wings made of elastomer integrally formed at two opposite edges of the window, respectively, wherein the window includes a transparent plastic base and at least one transparent coating comprising silicon oxide on the base; and

a lower cover engaging with the upper cover.

2. The protective sheath of claim 1, wherein the plastic base is made of polycarbonate.

3. The protective sheath of claim 1, wherein a thickness of the coating comprising silicon oxide is in the range from 3.5 to 4.0 micrometers.

4. A method for making a protective sheath for receiving a portable electronic device therein and protecting the portable electronic device from being scratched, comprising the steps of:

(1) injection molding a plastic base;

(2) pre-treating the base, comprising cleaning and pre-heating the base; and

(3) putting the pre-treated base in a vacuum chamber for plasma chemical vapor deposition treatment;

whereby a coating comprising silicon oxide is formed on a surface of the base.

5. The method of claim 4, wherein in step (2) the pre-treating process comprises cleaning the base using alcohol, drying the base, putting the base into an oven which has a temperature in the range from 105 to 130 degrees Celsius for a period of 20 to 40 minutes, and taking the base out of the oven for plasma chemical vapor deposition treatment thereafter.

6. The method of claim 4, wherein in step (3) the plasma chemical vapor deposition treatment comprises the steps of:

(1) creating a vacuum in the chamber;

(2) introducing reactive gases into the chamber, said reactive gases comprising 1,1,3,3-tetramethyldisiloxane and oxygen;

(3) maintaining a predetermined pressure in the chamber;

(4) applying high electrical power to cause the reactive gases to become an ionized plasma, said plasma reacting with a surface of the base to form a coating comprising silicon oxide thereon; and

(5) draining reacted gases from the chamber.

7. The method of claim 6, wherein the chamber is maintained below a pressure of 5 millitorrs.

8. The method of claim 6, wherein in step (2) 1,1,3,3-tetramethyldisiloxane is introduced into the chamber first, a volumetric flow rate of 1,1,3,3-tetramethyldisiloxane is maintained in the range from 50 to 150 standard cubic centimeters per minute, oxygen is introduced into the chamber after approximately 5 minutes at a volumetric flow rate in the range from 200 to 300 standard cubic centimeters per minute, and a ratio of volumes of oxygen and 1,1,3,3-tetramethyldisiloxane is approximately 7:

2.

9. The method of claim 6, wherein in step (2) high electrical power of 300 watts is provided, and the power has a frequency in the range from 298 to 300 megahertz.

10. The method of claim 6, wherein in step (3) the predetermined pressure is in the range from 50 to 55 mtorrs.

11. The method of claim 6, wherein in step (4) the electrical power is approximately 600 watts, the power has a frequency in the range from 598 to 600 megahertz, and the plasma chemical vapor deposition treatment is continued for approximately 25 minutes.

12. An electronic device assembly comprising:

a protective sheath including;

a lower cover;

an upper cover pivotally engaged with the lower cover and comprising a window with a transparent plastic base;

at least one transparent coating comprising silicon oxide applied on the base;

two side wings made of elastomer integrally formed at two opposite sides of the window, respectively; and

an electronic device removeably received within a spaced defined between the upper cover and the lower cover.