Lithographic apparatus and device manufacturing method
First Claim
Patent Images
1. A lithographic projection apparatus, comprising:
- a radiation system constructed and arranged to provide a projection beam of radiation;
a support structure constructed and arranged to supporting a patterning device, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;
a substrate table to hold a substrate;
a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;
a first compartment with a contaminant sensitive component within it;
a first gas supply constructed and arranged to purge the interior of the first compartment with a first purge gas; and
a second gas supply constructed and arranged to supply a flow of a second purge gas to an exterior surface of an enclosure defining the first compartment.
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Accused Products
Abstract
In a lithographic projection apparatus, ingress of contaminants to a component is prevented by providing a first flow of purge gas through the inside of a first compartment encapsulating the component and a second flow of purge gas to an external surface of the compartment.
21 Citations
14 Claims
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1. A lithographic projection apparatus, comprising:
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a radiation system constructed and arranged to provide a projection beam of radiation;
a support structure constructed and arranged to supporting a patterning device, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;
a substrate table to hold a substrate;
a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate;
a first compartment with a contaminant sensitive component within it;
a first gas supply constructed and arranged to purge the interior of the first compartment with a first purge gas; and
a second gas supply constructed and arranged to supply a flow of a second purge gas to an exterior surface of an enclosure defining the first compartment. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A device manufacturing method, comprising:
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providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
providing a projection beam of radiation using a radiation system;
using a patterning device to endow the projection beam with a pattern in its cross-section;
projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material;
providing a first flow of purge gas to purge the interior of a compartment containing a contaminant sensitive component of a device manufacturing apparatus; and
providing a second flow of purge gas to an exterior surface of an enclosure defining the compartment in order to purge the exterior surface.
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Specification