Tunable focus ring for plasma processing

  • US 20030201069A1
  • Filed: 03/05/2003
  • Published: 10/30/2003
  • Est. Priority Date: 09/18/2000
  • Status: Abandoned Application
First Claim
Patent Images

1. A focus ring assembly apparatus for a plasma reactor system for processing a workpiece having an outer edge and an upper surface, comprising:

  • a) a ring electrode;

    b) a focus ring made of nonconductive material arranged atop, and insulated from, said ring electrode;

    c) a first RF power supply electrically connected to said focus ring electrode; and

    d) a tuning network arranged between said first RF power supply and said ring electrode.

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