Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
First Claim
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1. An electron beam apparatus for evaluating a sample, comprising:
- a multi-beam generator having at least an electron gun with an anode and a cathode, for generating a plurality of primary electron beams to be irradiated to the sample;
a beam diameter setting device having at least one lens, for changing a beam diameter of the primary electron beams.
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Abstract
The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.
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5 Claims
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1. An electron beam apparatus for evaluating a sample, comprising:
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a multi-beam generator having at least an electron gun with an anode and a cathode, for generating a plurality of primary electron beams to be irradiated to the sample;
a beam diameter setting device having at least one lens, for changing a beam diameter of the primary electron beams. - View Dependent Claims (2, 3, 4, 5)
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Specification