Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
First Claim
1. A method of forming a precursor for use in manufacturing microelectronic, optoelectronic, photonic, or microelectromechanical system devices, said method comprising the steps of:
- providing a quantity of monomers and a substrate having a surface onto which a coating layer is to be applied, said monomers having the formula wherein;
each R is individually selected from the group consisting of alkynyl groups and alkenyl groups other than —
CH═
CH2 and —
CH2—
CH═
CH2;
each X is individually selected from the group consisting of alkyl groups, cyano groups, nitroso groups, and the halogens;
m is 0-10; and
n is 1-12;
forming said monomers into a plasma; and
depositing said plasma monomers onto said substrate surface so as to form the coating layer thereon.
2 Assignments
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Accused Products
Abstract
An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The PECVD processes comprise providing a quantity of a polymer generated by introducing monomer vapors into a plasma state followed by polymerization thereof, with assistance of plasma energy, onto the surface of a substrate. The most preferred starting monomers are phenylacetylene, 4-ethynyltoluene, and 1-ethynyl-2-fluorobenzene. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 μm or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.
33 Citations
34 Claims
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1. A method of forming a precursor for use in manufacturing microelectronic, optoelectronic, photonic, or microelectromechanical system devices, said method comprising the steps of:
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providing a quantity of monomers and a substrate having a surface onto which a coating layer is to be applied, said monomers having the formula wherein;
each R is individually selected from the group consisting of alkynyl groups and alkenyl groups other than —
CH═
CH2 and —
CH2—
CH═
CH2;
each X is individually selected from the group consisting of alkyl groups, cyano groups, nitroso groups, and the halogens;
m is 0-10; and
n is 1-12;
forming said monomers into a plasma; and
depositing said plasma monomers onto said substrate surface so as to form the coating layer thereon. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. A precursor structure formed during the process of manufacturing microelectronic, optoelectronic, photonic, or microelectromechanical system devices, said structure comprising:
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a substrate having a surface; and
a coating layer on said surface, said coating layer being formed by the steps of;
providing a quantity of monomers having the formula wherein;
each R is individually selected from the group consisting of alkynyl groups and alkenyl groups other than —
CH═
CH2 and —
CH2—
CH═
CH2;
each X is individually selected from the group consisting of alkyl groups, cyano groups, nitroso groups, and the halogens;
m is 0-10; and
n is 1-12;
forming said monomers into a plasma; and
depositing said plasma monomers onto said substrate surface so as to form the coating layer thereon. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
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Specification