Wafer handler

• US 20030234548A1
• Filed: 06/24/2002
• Published: 12/25/2003
• Est. Priority Date: 06/24/2002
• Status: Abandoned Application

• Current Assignee: ASM America Incorporated (ASM International NV)
• Original Assignee: ASM America Incorporated (ASM International NV)
• Inventors: Aggarwal, Ravinder
• Application Number:
  US10/179,736
• Publication Number:
  US 20030234548A1
• Time in Patent Office: Days
• US Class Current: 294/188
• CPC Class Codes: B25B 11/007 portable, e.g. handheld
• CPC Class Codes: H01L 21/6838 with gripping and holding devices using a vacuum; Bernoulli devices

Abstract

Manually operated wafer handlers are provided for handling and transporting semiconductor wafers. The wafer handlers contact the wafers only at the outer edges of the wafers, thereby preventing damage to the interior surfaces of the wafers on which integrated circuits are formed.

Claims

1. An apparatus for manually transporting a semiconductor wafer, comprising:

a handle; and

a grip portion at an end of the handle, the grip portion adapted to extend along a peripheral edge of the wafer and having an upper surface for supporting the wafer, the upper surface having a plurality of vacuum ports therein.

2. The apparatus of claim 1, wherein the grip portion includes a recessed area at a front end of the grip portion, the recessed area shaped to accommodate the peripheral edge of the wafer.

3. The apparatus of claim 2, wherein the upper surface of the recessed area is sized to extend inwardly from the peripheral edge of the wafer towards the center of the wafer less than about 5 mm.

4. The apparatus of claim 2, wherein the upper surface of the recessed area is sized to extend inwardly from the peripheral edge of the wafer towards the center of the wafer less than about 3 mm.

5. The apparatus of claim 2, further comprising a gas passage extending along the handle and the grip portion, the vacuum ports being in fluid communication with the gas passage.

6. The apparatus of claim 5, further comprising a vacuum release opening in fluid communication with the gas passage, the release opening adapted to be manually obstructed by a user to increase a strength of a vacuum applied at the vacuum ports.

7. An apparatus for transporting a semiconductor wafer, comprising:

a handle;

a grip portion at an end of the handle, the grip portion having a recessed area in an upper surface thereof and a plurality of vacuum ports in an upper surface of the recessed area.

8. The apparatus of claim 7, wherein the handle includes a vacuum release opening

9. The apparatus of claim 8, wherein the vacuum release opening can be manually obstructed to selectively increase a vacuum strength delivered at the vacuum ports.

10. The apparatus of claim 7, wherein the recessed area comprises a generally arc-shaped surface.

11. The apparatus of claim 10, wherein the recessed area is sized to extend about 90 degrees along the edge of the wafer.

12. The apparatus of claim 10, wherein a wall is formed between the recessed area and the rest of the grip portion.

13. The apparatus of claim 12, wherein a width of the recessed area between the wall and a side of the recessed area opposite the wall is between about 5 mm and 10 mm.

14. The apparatus of claim 7, further comprising a wafer support adjacent each of the vacuum ports, the wafer supports extending above an upper surface of the recessed area.

15. The apparatus of claim 14, wherein the wafer supports are formed integrally with the recessed area.

16. The apparatus of claim 14, wherein the wafer supports are bonded to an upper surface of the recessed portion.

17. An apparatus for transporting a semiconductor wafer, comprising:

a handle; and

a grip portion having a plurality of vacuum ports therein, the vacuum ports generally lying on a circle having a diameter slightly less than a diameter of the wafer.

18. The apparatus of claim 17, wherein the diameter of the circle is between about 0.2 mm and 10 mm less than the diameter of the wafer.

19. The apparatus of claim 18, wherein the diameter of the circle is between about 290 mm and 299.8 mm.

20. The apparatus of claim 17, wherein the diameter of the circle is between about 0.4 mm and 5 mm less than the diameter of the wafer.

21. The apparatus of claim 20, wherein the diameter of the circle is between about 295 mm and 299.6 mm.

22. The apparatus of claim 17, wherein the grip portion comprises a main body and a plurality of fingers extending from the main body, the vacuum ports being formed in an upper surface of the main body and an upper surface of each of the fingers.

23. The apparatus of claim 22, further comprising a wafer support provided adjacent each of the vacuum ports.

24. The apparatus of claim 17, wherein the grip portion comprises an arc-shaped surface adapted to extend along a peripheral edge of the wafer.

25. An apparatus for transporting a semiconductor wafer, comprising:

a handle; and

a grip portion at an end of the handle, the grip portion comprising a main body and a plurality of fingers extending from the main body, the grip portion having a plurality of vacuum ports in an upper surface thereof and a wafer support adjacent each of the vacuum ports, the wafer supports being arranged to contact the wafer only at an edge of the wafer.

26. The apparatus of claim 25, wherein the grip portion comprises two fingers.

27. The apparatus of claim 25, wherein the wafer supports extend above an upper surface of the main body and an upper surface of each of the fingers.

28. The apparatus of claim 27, wherein the wafer supports are coated with a low friction material.

29. The apparatus of claim 28, wherein the low friction material is TEFLON®

or VESPEL®

.

30. The apparatus of claim 25, wherein the wafer supports are arranged to contact the wafer no more than about 5 mm from the edge of the wafer.

31. The apparatus of claim 25, wherein the wafer supports are arranged to contact the wafer no more than about 3 mm from the edge of the wafer.

32. The apparatus of claim 25, further comprising a gas passage extending along the handle, the main body, and each of the fingers, the vacuum ports being in fluid communication with the gas passage.

33. The apparatus of claim 32, further comprising a vacuum release opening in fluid communication with the gas passage, the release opening adapted to be manually obstructed by a user to increase a strength of a vacuum applied at the vacuum ports.