Method of making a parallax barrier, parallax barrier and autostereoscopic display

• US 20030234980A1
• Filed: 06/06/2003
• Published: 12/25/2003
• Est. Priority Date: 06/11/2002
• Status: Active Grant

• Current Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Original Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Inventors: Montgomery, David James, Khazova, Marina
• Granted Patent: US 6,859,256 B2
• Time in Patent Office: Days
• US Class Current: 359/462
• CPC Class Codes: G02B 30/27 involving lenticular arrays
• CPC Class Codes: G02B 30/30 involving parallax barriers
• CPC Class Codes: H04N 13/31 using parallax barriers
• CPC Class Codes: H04N 13/32 using arrays of controllable light sources; using moving apertures or moving light sources

Abstract

A parallax barrier is made by developing a film exposed through a mask having elongate opaque regions interleaved with transparent regions. The film is exposed by a light source through the mask while the mask is moved so as to vary the exposure of each region of the film for forming the parallax barrier slit edges. Alternatively, the film or the light source may be moved during exposure. It is thus possible to make soft edge barriers, for example for use in autostereoscopic 3D displays.

Claims

1. A method of making a parallax barrier, comprising the steps of:

providing a first mask having a plurality of elongate opaque regions with longitudinal axes, said opaque regions being interleaved, in a first direction perpendicular to said longitudinal axes of said opaque regions, with a plurality of transparent regions;

exposing, during an exposure period, a photographic material to light from a light source through said first mask while, during at least part of said exposure period, moving at least one of said first mask, said material and said light source relative to at least one other of said first mask, said material and said light source so as to vary an exposure of each region of said material for forming a slit edge of said parallax barrier; and

developing said exposed material to form said parallax barrier.

2. A method as claimed in claim 1, in which said relative movement is in a direction parallel to said first direction.

3. A method as claimed in claim 1, in which said relative movement is in a direction perpendicular to said first direction and to said longitudinal axes of said opaque regions.

4. A method as claimed in claim 1, in which said first mask is moved relative to said material.

5. A method as claimed in claim 1, in which said first mask is spaced from said material and said light source is moved relative to said first mask.

6. A method as claimed in claim 1, in which said light source comprises a light emitter disposed behind a second mask defining an aperture.

7. A method as claimed in claim 5, in which said light source comprises a light emitter disposed behind a second mask defining an aperture and said second mask is moved relative to said first mask.

8. A method as claimed in claim 6, in which said light source comprises a plurality of light emitters which are switched so as to vary the direction of illumination of said material.

9. A method as claimed in claim 1, in which said light source comprises a plurality of light sources.

10. A method as claimed in claim 1, in which said opaque regions are substantially uniformly opaque.

11. A method as claimed in claim 1, in which said transparent regions are substantially uniformly transparent.

12. A method as claimed in claim 1, in which said transparent regions have edges whose transmissivity varies in said first direction.

13. A method as claimed in claim 1, in which said mask comprises a plurality of groups, each of which comprises a plurality of at least one of said opaque and transparent regions for forming a parallax barrier slit having a plurality of sub-apertures.

14. A method as claimed in claim 1, in which said material comprises a photographic emulsion on a substrate.

15. A method as claimed in claim 1, in which said material is arranged to darken as a result of said exposing step.

16. A method as claimed in claim 1, comprising using said parallax barrier in a copying process to make further parallax barriers.

17. A parallax barrier made by a method providing a first mask having a plurality of elongate opaque regions with longitudinal axes, said opaque regions being interleaved, in a first direction perpendicular to said longitudinal axes of said opaque regions, with a plurality of transparent regions;

exposing, during an exposure period, a photographic material to light from a light source through said first mask while, during at least part of said exposure period, moving at least one of said first mask, said material and said light source relative to at least one other of said first mask, said material and said light source so as to vary an exposure of each region of said material for forming a slit edge of said parallax barrier; and

developing said exposed material to form said parallax barrier.

18. An autostereoscopic three dimensional display comprising a parallax barrier made by a method providing a first mask having a plurality of elongate opaque regions with longitudinal axes, said opaque regions being interleaved, in a first direction perpendicular to said longitudinal axes of said opaque regions, with a plurality of transparent regions;

exposing, during an exposure period, a photographic material to light from a light source through said first mask while, during at least part of said exposure period, moving at least one of said first mask, said material and said light source relative to at least one other of said first mask, said material and said light source so as to vary an exposure of each region of said material for forming a slit edge of said parallax barrier; and

developing said exposed material to form said parallax barrier.