Integrated cooling substrate for extreme ultraviolet reticle

  • US 20040009410A1
  • Filed: 07/15/2002
  • Published: 01/15/2004
  • Est. Priority Date: 07/15/2002
  • Status: Active Grant
First Claim
Patent Images

1. A mask, wherein said mask comprises:

  • a substrate;

    a cooling layer on said substrate; and

    a planarizing layer on said cooling layer.

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