Alignment methods for imprint lithography
First Claim
Patent Images
1. A method of forming a pattern on a substrate comprising:
- obtaining an imprint lithography system, the imprint lithography system comprising;
a body;
a patterned template, wherein the patterned template is substantially transparent to activating light, wherein the patterned template comprises a first template alignment mark and a second template alignment mark;
an imprint head coupled to the body, wherein the imprint head is configured to hold the patterned template proximate to the substrate during use;
a motion stage coupled to the body, wherein the motion stage is configured to support a substrate, and wherein the motion stage is configured to move the substrate along a plane substantially parallel to the patterned template;
applying a predetermined amount of activating light curable liquid to the portion of the substrate, wherein the portion of the substrate comprises a first substrate alignment mark and a second substrate alignment mark;
rotating the substrate with respect to the template such that the second template alignment mark is substantially aligned with the second substrate alignment mark when the first template alignment mark is aligned with the first substrate alignment mark;
applying activating light to the activating light curable liquid, wherein the application of activating light substantially cures the activating light curable liquid;
separating the template from the cured liquid.
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Abstract
Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with the substrate is performed prior to curing the liquid. Alignment of the template with the substrate includes rotational alignment of the template with respect to the substrate.
219 Citations
49 Claims
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1. A method of forming a pattern on a substrate comprising:
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obtaining an imprint lithography system, the imprint lithography system comprising;
a body;
a patterned template, wherein the patterned template is substantially transparent to activating light, wherein the patterned template comprises a first template alignment mark and a second template alignment mark;
an imprint head coupled to the body, wherein the imprint head is configured to hold the patterned template proximate to the substrate during use;
a motion stage coupled to the body, wherein the motion stage is configured to support a substrate, and wherein the motion stage is configured to move the substrate along a plane substantially parallel to the patterned template;
applying a predetermined amount of activating light curable liquid to the portion of the substrate, wherein the portion of the substrate comprises a first substrate alignment mark and a second substrate alignment mark;
rotating the substrate with respect to the template such that the second template alignment mark is substantially aligned with the second substrate alignment mark when the first template alignment mark is aligned with the first substrate alignment mark;
applying activating light to the activating light curable liquid, wherein the application of activating light substantially cures the activating light curable liquid;
separating the template from the cured liquid. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
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34. A method of forming a pattern on a substrate comprising:
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obtaining an imprint lithography system, the imprint lithography system comprising;
a body;
a patterned template, wherein the patterned template is substantially transparent to activating light, wherein the patterned template comprises a first template alignment mark and a second template alignment mark;
an imprint head coupled to the body, wherein the imprint head is configured to hold the patterned template proximate to the substrate during use;
a motion stage coupled to the body, wherein the motion stage is configured to support the imprint head, and wherein the motion stage is configured to move the imprint head along a plane substantially parallel to the substrate, a substrate support coupled to the body, wherein the substrate support is configured to hold the substrate proximate to the patterned template during use, applying a predetermined amount of activating light curable liquid to the portion of the substrate, wherein the portion of the substrate comprises a first substrate alignment mark and a second substrate alignment mark;
rotating the template with respect to the substrate such that the second template alignment mark is substantially aligned with the second substrate alignment mark when the first template alignment mark is aligned with the first substrate alignment mark;
applying activating light to the activating light curable liquid, wherein the application of activating light substantially cures the activating light curable liquid;
separating the template from the cured liquid.
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35. A method of forming a pattern on a substrate comprising:
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obtaining an imprint lithography system, the imprint lithography system comprising;
a body;
a patterned template, wherein the patterned template is substantially transparent to activating light, wherein the patterned template comprises a first template alignment mark and a second template alignment mark;
an imprint head coupled to the body, wherein the imprint head is configured to hold the patterned template proximate to the substrate during use;
a motion stage coupled to the body, wherein the motion stage is configured to support a substrate, and wherein the motion stage is configured to move the substrate along a plane substantially parallel to the patterned template;
a first optical imaging device coupled to the imprint head;
a second optical imaging device coupled to the motion stage, and wherein the second optical imaging device is coupled to the motion stage such that the optical imaging device and substrate move together in the same direction during use; and
a system alignment target optically coupled to the first optical imaging device;
applying a predetermined amount of activating light curable liquid to the portion of the substrate, wherein the portion of the substrate comprises a first substrate alignment mark and a second substrate alignment mark;
determining the position of the first template alignment mark and the second template alignment mark with respect to the system alignment target using the second optical imaging device and the motion stage;
determining the position of the first substrate alignment mark and the second substrate alignment mark with respect to the system alignment target using the first optical imaging device and the motion stage;
aligning the first template alignment mark with the first substrate alignment mark and the second template alignment mark with the second substrate alignment mark;
applying activating light to the activating light curable liquid, wherein the application of activating light substantially cures the activating light curable liquid;
separating the template from the cured liquid. - View Dependent Claims (36, 37, 38)
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39. A method of forming a pattern on a substrate comprising:
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obtaining an imprint lithography system, the imprint lithography system comprising;
a body;
a patterned template, wherein the patterned template is substantially transparent to activating light, wherein the patterned template comprises a first template alignment mark and a second template alignment mark;
an imprint head, wherein the imprint head is configured to hold the patterned template;
a motion stage coupled to the body, wherein the motion stage is configured to support the imprint head, and wherein the motion stage is configured to move the imprint head along a plane substantially parallel to the substrate, a substrate support coupled to the body, wherein the substrate support is configured to hold the substrate proximate to the patterned template during use, a first optical imaging device coupled to the motion stage, and wherein the first optical imaging device is coupled to the motion stage such that the first optical imaging device and substrate move together in the same direction during use; and
a second optical imaging device coupled to the substrate support;
a system alignment target optically coupled to the first optical imaging device;
applying a predetermined amount of activating light curable liquid to the portion of the substrate, wherein the portion of the substrate comprises a first substrate alignment mark and a second substrate alignment mark;
determining the position of the first template alignment mark and the second template alignment mark with respect to the system alignment target using the second optical imaging device and the motion stage;
determining the position of the first substrate alignment mark and the second substrate alignment mark with respect to the system alignment target using the first optical imaging device and the motion stage;
aligning the first template alignment mark with the first substrate alignment mark and the second template alignment mark with the second substrate alignment mark;
applying activating light to the activating light curable liquid, wherein the application of activating light substantially cures the activating light curable liquid;
separating the template from the cured liquid.
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40. A method of forming a pattern on a substrate comprising:
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obtaining an imprint lithography system, the imprint lithography system comprising;
a body;
a patterned template, wherein the patterned template is substantially transparent to activating light, wherein the patterned template comprises a first template alignment mark and a second template alignment mark;
an imprint head coupled to the body, wherein the imprint head is configured to hold the patterned template proximate to the substrate during use;
a motion stage coupled to the body, wherein the motion stage is configured to support a substrate, and wherein the motion stage is configured to move the substrate along a plane substantially parallel to the patterned template;
a first optical imaging device coupled to the imprint head;
a second optical imaging device coupled to the motion stage, and wherein the second optical imaging device is coupled to the motion stage such that the optical imaging device and substrate move together in the same direction during use; and
a system alignment target optically coupled to the first optical imaging device;
performing an alignment method at two or more fields on the substrate, wherein each field of the substrate comprises a first substrate alignment mark and a second substrate alignment mark, the alignment method comprising;
determining the position of the first template alignment mark and the second template alignment mark with respect to the system alignment target using the second optical imaging device and the motion stage;
determining the position of the first substrate alignment mark and the second substrate alignment mark, disposed within a field of the substrate, with respect to the system alignment target using the first optical imaging device and the motion stage; and
determining the alignment error between the template and the substrate;
determining an average alignment error as a function of the alignment errors determined at two or more fields on the substrate;
applying a predetermined amount of activating light curable liquid to a field of the substrate;
aligning the template with the field of the substrate using the average alignment error to determine the appropriate movement of the substrate;
applying activating light to the activating light curable liquid disposed on the field of the substrate, wherein the application of activating light substantially cures the activating light curable liquid;
separating the template from the cured liquid on the first portion of the substrate. - View Dependent Claims (41, 42, 43)
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44. A method of forming a pattern on a substrate comprising:
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obtaining an imprint lithography system, the imprint lithography system comprising;
a body;
a patterned template, wherein the patterned template is substantially transparent to activating light, wherein the patterned template comprises a first template alignment mark and a second template alignment mark;
an imprint head coupled to the body, wherein the imprint head is configured to hold the patterned template proximate to the substrate during use;
a motion stage coupled to the body, wherein the motion stage is configured to support a substrate, and wherein the motion stage is configured to move the substrate along a plane substantially parallel to the patterned template;
a first optical imaging device coupled to the imprint head;
a second optical imaging device coupled to the motion stage, and wherein the second optical imaging device is coupled to the motion stage such that the optical imaging device and substrate move together in the same direction during use; and
a system alignment target optically coupled to the first optical imaging device;
applying a predetermined amount of activating light curable liquid to a first portion of the substrate, wherein the first portion of the substrate comprises a first substrate alignment mark and a second substrate alignment mark;
determining the position of the first template alignment mark and the second template alignment mark with respect to the system alignment target using the second optical imaging device;
determining the position of the first substrate alignment mark and the second substrate alignment mark with respect to the system alignment target using the first optical imaging device;
aligning the first template alignment mark with the first substrate alignment mark and the second template alignment mark with the second substrate alignment mark;
applying activating light to the activating light curable liquid disposed on the first portion of the substrate, wherein the application of activating light substantially cures the activating light curable liquid;
separating the template from the cured liquid on the first portion of the substrate;
applying a predetermined amount of activating light curable liquid to a second portion of the substrate, wherein the second portion of the substrate comprises a third substrate alignment mark and a fourth substrate alignment mark;
determining the position of the third substrate alignment mark and the fourth substrate alignment mark with respect to the system alignment target using the first optical imaging device;
aligning the first template alignment mark with the third substrate alignment mark and the second template alignment mark with the fourth substrate alignment mark;
applying activating light to the activating light curable liquid, wherein the application of activating light substantially cures the activating light curable liquid disposed on the second portion of the substrate; and
separating the template from the cured liquid on the second portion of the substrate.
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45. A method of forming a pattern on a substrate comprising:
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obtaining an imprint lithography system, the imprint lithography system comprising;
a body;
a patterned template, wherein the patterned template is substantially transparent to activating light, wherein the patterned template comprises a first template alignment mark and a second template alignment mark;
an imprint head coupled to the body, wherein the imprint head is configured to hold the patterned template proximate to the substrate during use;
a motion stage coupled to the body, wherein the motion stage is configured to support a substrate, and wherein the motion stage is configured to move the substrate along a plane substantially parallel to the patterned template;
an optical imaging device optically coupled to the template, wherein the optical imaging device is configured to obtain image data through at least two different portions of the template, applying a predetermined amount of activating light curable liquid to a portion of the substrate;
wherein the portion of the substrate comprises a first substrate alignment mark and a second substrate alignment mark;
aligning the first template alignment mark with the first substrate alignment mark;
determining the position of the second template alignment mark with respect to the second substrate alignment mark with the optical imaging device;
aligning the first template alignment mark with the first substrate alignment mark and the second template alignment mark with the second substrate alignment mark;
applying activating light to the activating light curable liquid, wherein the application of activating light substantially cures the activating light curable liquid;
separating the template from the cured liquid. - View Dependent Claims (46)
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47. A method of forming a pattern on a substrate comprising:
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obtaining an imprint lithography system, the imprint lithography system comprising;
a body;
a patterned template, wherein the patterned template is substantially transparent to activating light, wherein the patterned template comprises a first template alignment mark and a second template alignment mark;
an imprint head, wherein the imprint head is configured to hold the patterned template;
a motion stage coupled to the body, wherein the motion stage is configured to support the imprint head, and wherein the motion stage is configured to move the imprint head along a plane substantially parallel to the substrate, a substrate support coupled to the body, wherein the substrate support is configured to hold the substrate proximate to the patterned template during use, an optical imaging device optically coupled to the template, wherein the optical imaging device is configured to obtain image data through at least two different portions of the template, applying a predetermined amount of activating light curable liquid to a portion of the substrate;
wherein the portion of the substrate comprises a first substrate alignment mark and a second substrate alignment mark;
aligning the first template alignment mark with the first substrate alignment mark;
determining the position of the second template alignment mark with respect to the second substrate alignment mark with the optical imaging device;
aligning the first template alignment mark with the first substrate alignment mark and the second template alignment mark with the second substrate alignment mark;
applying activating light to the activating light curable liquid, wherein the application of activating light substantially cures the activating light curable liquid;
separating the template from the cured liquid.
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48. A method of forming a pattern on a substrate comprising:
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obtaining an imprint lithography system, the imprint lithography system comprising;
a body;
a patterned template, wherein the patterned template is substantially transparent to activating light, wherein the patterned template comprises a first template alignment mark and a second template alignment mark;
an imprint head coupled to the body, wherein the imprint head is configured to hold the patterned template proximate to the substrate during use;
a motion stage coupled to the body, wherein the motion stage is configured to support a substrate, and wherein the motion stage is configured to move the substrate along a plane substantially parallel to the patterned template;
an optical imaging device optically coupled to the template, wherein the optical imaging device is configured to obtain image data through at least two different portions of the template, performing an alignment method at two or more fields on the substrate, wherein each field of the substrate comprises a first substrate alignment mark and a second substrate alignment mark, the alignment method comprising;
aligning the first template alignment mark with the first substrate alignment mark;
determining the position of the second template alignment mark with respect to the second substrate alignment mark with the optical imaging device;
aligning the first template alignment mark with the first substrate alignment mark and the second template alignment mark with the second substrate alignment mark; and
determining the alignment error between the template and the substrate;
determining an average alignment error as a function of the alignment errors determined at two or more fields on the substrate;
applying a predetermined amount of activating light curable liquid to a field of the substrate;
aligning the template with the field of the substrate using the average alignment error to determine the appropriate movement of the substrate;
applying activating light to the activating light curable liquid disposed on the field of the substrate, wherein the application of activating light substantially cures the activating light curable liquid;
separating the template from the cured liquid on the first portion of the substrate.
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49. A method of forming a pattern on a substrate comprising:
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obtaining an imprint lithography system, the imprint lithography system comprising;
a body;
a patterned template, wherein the patterned template is substantially transparent to activating light, wherein the patterned template comprises a first template alignment mark and a second template alignment mark;
an imprint head coupled to the body, wherein the imprint head is configured to hold the patterned template proximate to the substrate during use;
a motion stage coupled to the body, wherein the motion stage is configured to support a substrate, and wherein the motion stage is configured to move the substrate along a plane substantially parallel to the patterned template;
an optical imaging device optically coupled to the template, wherein the optical imaging device is configured to obtain image data through at least two different portions of the template, applying a predetermined amount of activating light curable liquid to a portion of the substrate;
wherein the portion of the substrate comprises a first substrate alignment mark and a second substrate alignment mark;
aligning the first template alignment mark with the first substrate alignment mark;
determining the position of the second template alignment mark with respect to the second substrate alignment mark with the optical imaging device;
aligning the first template alignment mark with the first substrate alignment mark and the second template alignment mark with the second substrate alignment mark;
applying activating light to the activating light curable liquid, wherein the application of activating light substantially cures the activating light curable liquid;
separating the template from the cured liquid;
applying a predetermined amount of activating light curable liquid to a second portion of the substrate, wherein the second portion of the substrate comprises a third substrate alignment mark and a fourth substrate alignment mark;
aligning the first template alignment mark with the third substrate alignment mark;
determining the position of the second template alignment mark with respect to the fourth substrate alignment mark with the optical imaging device;
aligning the first template alignment mark with the third substrate alignment mark and the second template alignment mark with the fourth substrate alignment mark;
applying activating light to the activating light curable liquid, wherein the application of activating light substantially cures the activating light curable liquid disposed on the second portion of the substrate; and
separating the template from the cured liquid on the second portion of the substrate.
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Specification