Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide

  • US 20040043149A1
  • Filed: 09/02/2003
  • Published: 03/04/2004
  • Est. Priority Date: 09/28/2000
  • Status: Active Grant
First Claim
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1. A process for forming materials comprising silicon, oxygen and one or more metals or metalloids, comprising:

  • reacting the vapor of one of an alkoxysilanol and an alkoxysilanediol together with a vapor of one or more of a metal compound and a metalloid compound.

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